Issued Patents All Time
Showing 26–50 of 61 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| RE47440 | Apparatus and method for providing uniform flow of gas | Joseph Yudovsky, Mei Chang, Faruk Gungor, Paul F. Ma, David Chu +2 more | 2019-06-18 |
| 9947578 | Methods for forming low-resistance contacts through integrated process flow systems | Yu Lei, Vikash Banthia, Kai Wu, Xinyu Fu, Yi Xu +9 more | 2018-04-17 |
| 9831109 | High temperature process chamber lid | Ilker Durukan, Joel M. Huston, Chien-Teh Kao, Mei Chang | 2017-11-28 |
| 9683287 | Deposition of films comprising aluminum alloys with high aluminum content | David Thompson, Srinivas Gandikota, Xinliang Lu, Wei V. Tang, Jing Zhou +6 more | 2017-06-20 |
| 9466524 | Method of depositing metals using high frequency plasma | Paul F. Ma, Guojun Liu, Annamalai Lakshmanan, Anantha K. Subramani | 2016-10-11 |
| 9447497 | Processing chamber gas delivery system with hot-swappable ampoule | Mark S. Johnson, David Santi, Hyman Lam | 2016-09-20 |
| 9145612 | Deposition of N-metal films comprising aluminum alloys | Srinivas Gandikota, Xinliang Lu, Shih Chung Chen, Wei V. Tang, Jing Zhou +8 more | 2015-09-29 |
| 9109754 | Apparatus and method for providing uniform flow of gas | Joseph Yudovsky, Mei Chang, Faruk Gungor, Paul F. Ma, David Chu +2 more | 2015-08-18 |
| 9032906 | Apparatus and process for plasma-enhanced atomic layer deposition | Paul F. Ma, Kavita Shah, Seshadri Ganguli, Christophe Marcadal, Frederick Wu +1 more | 2015-05-19 |
| 8955547 | Apparatus and method for providing uniform flow of gas | Faruk Gungor, Joseph Yudovsky, Mei Chang | 2015-02-17 |
| 8951478 | Ampoule with a thermally conductive coating | Schubert S. Chu, Christophe Marcadal, Seshadri Ganguli, Norman Nakashima | 2015-02-10 |
| 8668776 | Gas delivery apparatus and method for atomic layer deposition | Ling Chen, Vincent Ku, Hua Chung, Alan Ouye, Norman Nakashima | 2014-03-11 |
| 8491967 | In-situ chamber treatment and deposition process | Paul F. Ma, Joseph AuBuchon, Mei Chang, Steven H. Kim, Norman Nakashima +2 more | 2013-07-23 |
| 8146896 | Chemical precursor ampoule for vapor deposition processes | Olkan Cuvalci, Xiaoxiong Yuan | 2012-04-03 |
| 8070879 | Apparatus and method for hybrid chemical processing | Ling Chen, Vincent Ku, Mei Chang, Hua Chung | 2011-12-06 |
| 8062422 | Method and apparatus for generating a precursor for a semiconductor processing system | Ling Chen, Vincent Ku, Hua Chung, Christophe Marcadal, Seshadri Ganguli +3 more | 2011-11-22 |
| 7850779 | Apparatus and process for plasma-enhanced atomic layer deposition | Paul F. Ma, Kavita Shah, Seshadri Ganguli, Christophe Marcadal, Frederick Wu +1 more | 2010-12-14 |
| 7833358 | Method of recovering valuable material from exhaust gas stream of a reaction chamber | Schubert S. Chu, Frederick Wu, Christophe Marcadal, Seshadri Ganguli, Kavita Shah +1 more | 2010-11-16 |
| 7780789 | Vortex chamber lids for atomic layer deposition | Puneet Bajaj, Xiaoxiong Yuan, Steven H. Kim, Schubert S. Chu, Paul F. Ma +1 more | 2010-08-24 |
| 7780788 | Gas delivery apparatus for atomic layer deposition | Ling Chen, Vincent Ku, Hua Chung, Alan Ouye, Norman Nakashima | 2010-08-24 |
| 7780785 | Gas delivery apparatus for atomic layer deposition | Ling Chen, Vincent Ku, Hua Chung, Alan Ouye, Norman Nakashima +1 more | 2010-08-24 |
| 7775508 | Ampoule for liquid draw and vapor draw with a continuous level sensor | Kenric Choi, Pravin K. Narwankar, Shreyas Kher, Son T. Nguyen, Paul Deaton +3 more | 2010-08-17 |
| 7699023 | Gas delivery apparatus for atomic layer deposition | Ling Chen, Vincent Ku, Hua Chung, Alan Ouye, Norman Nakashima +1 more | 2010-04-20 |
| 7682946 | Apparatus and process for plasma-enhanced atomic layer deposition | Paul F. Ma, Kavita Shah, Seshadri Ganguli, Christophe Marcadal, Frederick Wu +1 more | 2010-03-23 |
| 7597758 | Chemical precursor ampoule for vapor deposition processes | Ling Chen, Vincent Ku, Hua Chung, Christophe Marcadal, Seshadri Ganguli +3 more | 2009-10-06 |