Issued Patents All Time
Showing 1–20 of 20 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9269574 | Methods of fabricating dielectric films from metal amidinate precursors | Steven C. H. Hung, Atif Noori, David Thompson | 2016-02-23 |
| 9011973 | Methods for depositing oxygen deficient metal films | Schubert S. Chu, Er-Xuan Ping | 2015-04-21 |
| 7470470 | System and method for forming multi-component dielectric films | Seung Park | 2008-12-30 |
| 7335569 | In-situ formation of metal insulator metal capacitors | — | 2008-02-26 |
| 7205247 | Atomic layer deposition of hafnium-based high-k dielectric | Sang In Lee, Jon S. Owyang, Aubrey L. Helms, Jr., Karem Kapkin | 2007-04-17 |
| 6933011 | Two-step atomic layer deposition of copper layers | — | 2005-08-23 |
| 6713846 | Multilayer high &kgr; dielectric films | — | 2004-03-30 |
| 6616972 | Synthesis of metal oxide and oxynitride | Arthur Kenneth Hochberg, Kirk Scott Cuthill | 2003-09-09 |
| 6537613 | Process for metal metalloid oxides and nitrides with compositional gradients | Arthur Kenneth Hochberg, John Anthony Thomas Norman | 2003-03-25 |
| 6503561 | Liquid precursor mixtures for deposition of multicomponent metal containing materials | David A. Roberts, John Anthony Thomas Norman, Arthur Kenneth Hochberg | 2003-01-07 |
| 6500499 | Deposition and annealing of multicomponent ZrSnTi and HfSnTi oxide thin films using solventless liquid mixture of precursors | Arthur Kenneth Hochberg, David A. Roberts, John Anthony Thomas Norman, Glenn B. Alers, Robert McLemore Fleming | 2002-12-31 |
| 6319567 | Synthesis of tantalum nitride | Arthur Kenneth Hochberg, John Anthony Thomas Norman | 2001-11-20 |
| 6238734 | Liquid precursor mixtures for deposition of multicomponent metal containing materials | David A. Roberts, John Anthony Thomas Norman | 2001-05-29 |
| 6096913 | Production of metal-ligand complexes | John Anthony Thomas Norman, David A. Roberts | 2000-08-01 |
| 6090960 | Precursor with (methoxy) (methyl) silylolefin ligand to deposit copper and method same | Lawrence J. Charneski, Masato Kobayashi, Tue Nguyen | 2000-07-18 |
| 6046364 | Regeneration of metal CVD precursors | John Anthony Thomas Norman, John C. Gordon | 2000-04-04 |
| 5767301 | Precursor with (alkyloxy)(alkyl)-silylolefin ligand to deposit copper | Masato Kobayashi, Lawrence J. Charneski, Tue Nguyen | 1998-06-16 |
| 5744192 | Method of using water vapor to increase the conductivity of cooper desposited with cu(hfac)TMVS | Tue Nguyen, Masato Kobayashi, Lawrence J. Charneski, Sheng Teng Hsu | 1998-04-28 |
| 5372849 | Chemical vapor deposition of iron, ruthenium, and osmium | Fred B. McCormick, Wayne L. Gladfelter | 1994-12-13 |
| 5314727 | Chemical vapor deposition of iron, ruthenium, and osmium | Fred B. McCormick, Wayne L. Gladfelter | 1994-05-24 |