Issued Patents All Time
Showing 1–25 of 57 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10914001 | Volatile dihydropyrazinly and dihydropyrazine metal complexes | Sergei Vladimirovich Ivanov, Xinjian Lei | 2021-02-09 |
| 9994954 | Volatile dihydropyrazinly and dihydropyrazine metal complexes | Sergei Vladimirovich Ivanov, Xinjian Lei | 2018-06-12 |
| 9018387 | Complexes of imidazole ligands | Melanie K. Perez, Xinjian Lei, Daniel P. Spence, Sergei Vladimirovich Ivanov, Wade Hampton Bailey, III | 2015-04-28 |
| 8962875 | Metal-enolate precursors for depositing metal-containing films | Xinjian Lei | 2015-02-24 |
| 8859785 | Volatile group 2 metal precursors | — | 2014-10-14 |
| 8703103 | Volatile imidazoles and group 2 imidazole based metal precursors | Melanie K. Perez, Moo-Sung Kim | 2014-04-22 |
| 8680289 | Complexes of imidazole ligands | Melanie K. Perez, Xinjian Lei, Daniel P. Spence, Sergei Vladimirovich Ivanov, Wade Hampton Bailey, III | 2014-03-25 |
| 8592606 | Liquid precursor for depositing group 4 metal containing films | Xinjian Lei, Daniel P. Spence | 2013-11-26 |
| 8507704 | Liquid composition containing aminoether for deposition of metal-containing films | Sergei Vladimirovich Ivanov, Xinjian Lei, Daniel P. Spence, Laura M. Matz | 2013-08-13 |
| 8313807 | High coordination sphere group 2 metal β-diketiminate precursors | Xinjian Lei | 2012-11-20 |
| 8293001 | Porogens, porogenated precursors and methods for using the same to provide porous organosilica glass films with low dielectric constants | Raymond Nicholas Vrtis, Mark Leonard O'Neill, Jean Louise Vincent, Aaron Scott Lukas, Manchao Xiao | 2012-10-23 |
| 8283485 | Process for selectively depositing copper thin films on substrates with copper and ruthenium areas via vapor deposition | — | 2012-10-09 |
| 8263795 | Copper precursors for thin film deposition | Melanie K. Perez | 2012-09-11 |
| 8143431 | Low temperature thermal conductive inks | Melanie K. Perez, Robert K. Pinschmidt, Jr. | 2012-03-27 |
| 7985449 | Methods for depositing metal films onto diffusion barrier layers by CVD or ALD processes | Diwakar Garg, Hansong Cheng, Eduardo Machado, Pablo Ordejon | 2011-07-26 |
| 7943195 | Porogens, porogenated precursors and methods for using the same to provide porous organosilica glass films with low dielectric constants | Raymond Nicholas Vrtis, Mark Leonard O'Neill, Jean Louise Vincent, Aaron Scott Lukas, Manchao Xiao | 2011-05-17 |
| 7919409 | Materials for adhesion enhancement of copper film on diffusion barriers | Hansong Cheng, Xinjian Lei, Daniel P. Spence, David A. Roberts, Bo Han +2 more | 2011-04-05 |
| 7754906 | Ti, Ta, Hf, Zr and related metal silicon amides for ALD/CVD of metal-silicon nitrides, oxides or oxynitrides | Xinjian Lei | 2010-07-13 |
| 7524533 | Diffusion barrier layers and processes for depositing metal films thereupon by CVD or ALD processes | Diwakar Garg, Hansong Cheng, Eduardo Machado, Pablo Ordejon | 2009-04-28 |
| 7384471 | Porogens, porogenated precursors and methods for using the same to provide porous organosilica glass films with low dielectric constants | Raymond Nicholas Vrtis, Mark Leonard O'Neill, Jean Louise Vincent, Aaron Scott Lukas, Manchao Xiao | 2008-06-10 |
| 7311946 | Methods for depositing metal films on diffusion barrier layers by CVD or ALD processes | Diwakar Garg, Hansong Cheng, Eduardo Machado, Pablo Ordejon | 2007-12-25 |
| 7205422 | Volatile metal β-ketoiminate and metal β-diiminate complexes | — | 2007-04-17 |
| 7034169 | Volatile metal β-ketoiminate complexes | — | 2006-04-25 |
| 6869876 | Process for atomic layer deposition of metal films | David A. Roberts, Melanie Boze | 2005-03-22 |
| 6846515 | Methods for using porogens and/or porogenated precursors to provide porous organosilica glass films with low dielectric constants | Raymond Nicholas Vrtis, Mark Leonard O'Neill, Jean Louise Vincent, Aaron Scott Lukas, Manchao Xiao | 2005-01-25 |