JN

John Anthony Thomas Norman

Air Products And Chemicals: 53 patents #5 of 1,997Top 1%
UI Uarco Incorporated: 2 patents #5 of 42Top 15%
VU Versum Materials Us: 2 patents #63 of 174Top 40%
📍 Encinitas, CA: #35 of 1,440 inventorsTop 3%
🗺 California: #6,332 of 386,348 inventorsTop 2%
Overall (All Time): #43,165 of 4,157,543Top 2%
57
Patents All Time

Issued Patents All Time

Showing 26–50 of 57 patents

Patent #TitleCo-InventorsDate
6838573 Copper CVD precursors with enhanced adhesion properties Morteza Farnia, Robert Sam Zorich, James Richard Thurmond 2005-01-04
6818783 Volatile precursors for deposition of metals and metal-containing films David A. Roberts, Morteza Farnia, Melanie Boze 2004-11-16
6552209 Preparation of metal imino/amino complexes for metal oxide and metal nitride thin films Xinjian Lei 2003-04-22
6537613 Process for metal metalloid oxides and nitrides with compositional gradients Yoshihide Senzaki, Arthur Kenneth Hochberg 2003-03-25
6503561 Liquid precursor mixtures for deposition of multicomponent metal containing materials Yoshihide Senzaki, David A. Roberts, Arthur Kenneth Hochberg 2003-01-07
6500499 Deposition and annealing of multicomponent ZrSnTi and HfSnTi oxide thin films using solventless liquid mixture of precursors Yoshihide Senzaki, Arthur Kenneth Hochberg, David A. Roberts, Glenn B. Alers, Robert McLemore Fleming 2002-12-31
6319567 Synthesis of tantalum nitride Yoshihide Senzaki, Arthur Kenneth Hochberg 2001-11-20
6238734 Liquid precursor mixtures for deposition of multicomponent metal containing materials Yoshihide Senzaki, David A. Roberts 2001-05-29
6096913 Production of metal-ligand complexes Yoshihide Senzaki, David A. Roberts 2000-08-01
6046364 Regeneration of metal CVD precursors John C. Gordon, Yoshihide Senzaki 2000-04-04
RE35614 Process for improved quality of CVD copper films Arthur Kenneth Hochberg, David A. Roberts 1997-09-23
5322712 Process for improved quality of CVD copper films Arthur Kenneth Hochberg, David A. Roberts 1994-06-21
5319118 Volatile barium precursor and use of precursor in OMCVD process Beth A. Muratore, Paul N. Dyer 1994-06-07
5273775 Process for selectively depositing copper aluminum alloy onto a substrate Paul N. Dyer, Stephen M. Fine 1993-12-28
5252733 Volatile crown ligand .beta.-diketonate alkaline earth metal complexes Guido P. Pez 1993-10-12
5221366 Etching agents comprising .beta.-diketone and .beta.-ketoimine ligands and a process for using the same David A. Roberts, John C. Ivankovits, David A. Bohling 1993-06-22
5187300 Volatile precursors for copper CVD 1993-02-16
5144049 Volatile liquid precursors for the chemical vapor deposition of copper Beth A. Muratore 1992-09-01
5098516 Processes for the chemical vapor deposition of copper and etching of copper Paul N. Dyer 1992-03-24
5094701 Cleaning agents comprising beta-diketone and beta-ketoimine ligands and a process for using the same John C. Ivankovits, David A. Roberts, David A. Bohling 1992-03-10
5085731 Volatile liquid precursors for the chemical vapor deposition of copper Beth A. Muratore 1992-02-04
5062902 Fluxing agents comprising .beta.-diketone and .beta.-ketoimine ligands and a process for using the same Thomas L. Ellison, David A. Roberts, John C. Ivankovits 1991-11-05
5028724 Synthesis of volatile fluorinated and non-fluorinated metal-beta-ketonate and metal-beta-ketoiminato complexes John C. Ivankovits, David A. Bohling, David A. Roberts 1991-07-02
5009725 Fluxing agents comprising .beta.-diketone and .beta.-ketoimine ligands and a process for using the same Thomas L. Ellison, David A. Roberts, John C. Ivankovits 1991-04-23
5008415 Volatile fluorinated .beta.-ketoimines and associated metal complexes 1991-04-16