AH

Arthur Kenneth Hochberg

Air Products And Chemicals: 29 patents #40 of 1,997Top 3%
BU Burroughs: 1 patents #265 of 604Top 45%
VU Versum Materials Us: 1 patents #84 of 174Top 50%
📍 San Diego, CA: #1,174 of 23,606 inventorsTop 5%
🗺 California: #15,733 of 386,348 inventorsTop 5%
Overall (All Time): #113,579 of 4,157,543Top 3%
32
Patents All Time

Issued Patents All Time

Showing 1–25 of 32 patents

Patent #TitleCo-InventorsDate
9640386 Precursors for CVD silicon carbo-nitride films Manchao Xiao 2017-05-02
8932675 Methods for depositing silicon carbo-nitride film Manchao Xiao 2015-01-13
8383849 Precursors for CVD silicon carbo-nitride films Manchao Xiao 2013-02-26
7932413 Precursors for CVD silicon carbo-nitride films Manchao Xiao 2011-04-26
7875556 Precursors for CVD silicon carbo-nitride and silicon nitride films Manchao Xiao 2011-01-25
7582574 Diethylsilane as a silicon source in the deposition of metal silicate films Robert D. Clark, Hareesh Thridandam, Kirk Scott Cuthill 2009-09-01
7288145 Precursors for depositing silicon containing films Manchao Xiao, Kirk Scott Cuthill 2007-10-30
7261118 Method and vessel for the delivery of precursor materials Charles Michael Birtcher, Richard J. Dunning, Robert D. Clark, Thomas Andrew Steidl 2007-08-28
7122222 Precursors for depositing silicon containing films and processes thereof Manchao Xiao, Kirk Scott Cuthill 2006-10-17
7033560 Single source mixtures of metal siloxides Robert D. Clark 2006-04-25
6844271 Process of CVD of Hf and Zr containing oxynitride films John D. Loftin, Robert D. Clark 2005-01-18
6616972 Synthesis of metal oxide and oxynitride Yoshihide Senzaki, Kirk Scott Cuthill 2003-09-09
6537613 Process for metal metalloid oxides and nitrides with compositional gradients Yoshihide Senzaki, John Anthony Thomas Norman 2003-03-25
6503561 Liquid precursor mixtures for deposition of multicomponent metal containing materials Yoshihide Senzaki, David A. Roberts, John Anthony Thomas Norman 2003-01-07
6500499 Deposition and annealing of multicomponent ZrSnTi and HfSnTi oxide thin films using solventless liquid mixture of precursors Yoshihide Senzaki, David A. Roberts, John Anthony Thomas Norman, Glenn B. Alers, Robert McLemore Fleming 2002-12-31
6319567 Synthesis of tantalum nitride Yoshihide Senzaki, John Anthony Thomas Norman 2001-11-20
5976991 Deposition of silicon dioxide and silicon oxynitride using bis(tertiarybutylamino) silane Ravi Laxman, David A. Roberts 1999-11-02
5874368 Silicon nitride from bis(tertiarybutylamino)silane Ravi Laxman, David A. Roberts, Herman Gene Hockenhull, Felicia Diane Kaminsky 1999-02-23
5744196 Low temperature deposition of silicon dioxide using organosilanes Ravi Laxman 1998-04-28
RE35614 Process for improved quality of CVD copper films John Anthony Thomas Norman, David A. Roberts 1997-09-23
5626775 Plasma etch with trifluoroacetic acid and derivatives David A. Roberts, Raymond Nicholas Vrtis, Robert G. Bryant, John Giles Langan 1997-05-06
5492736 Fluorine doped silicon oxide process Ravi Laxman, David A. Roberts, Raymond Nicholas Vrtis 1996-02-20
5433975 Deposition of tungsten films from mixtures of tungsten hexafluoride organohydrosilanes and hydrogen David A. Roberts, Diwakar Garg, Andre Lagendijk, Stephen M. Fine 1995-07-18
5322712 Process for improved quality of CVD copper films John Anthony Thomas Norman, David A. Roberts 1994-06-21
5298075 Furnace tube cleaning process Andre Lagendijk, David A. Roberts 1994-03-29