Issued Patents All Time
Showing 1–13 of 13 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8535760 | Additives to silane for thin film silicon photovoltaic devices | Patrick T. Hurley, Robert Gordon Ridgeway, Katherine Anne Hutchison | 2013-09-17 |
| 8283260 | Process for restoring dielectric properties | Scott J. Weigel, Mark Leonard O'Neill, Mary Kathryn Haas, Laura M. Matz, Glenn Michael Mitchell +2 more | 2012-10-09 |
| 7479191 | Method for endpointing CVD chamber cleans following ultra low-k film treatments | William Robert Entley, Amith Kumar Murali, Kathleen Anna Bennett | 2009-01-20 |
| 7013916 | Sub-atmospheric gas delivery method and apparatus | Ronald Martin Pearlstein, Dao-Hong Zheng, John Irven, Benjamin Lee Hertzler | 2006-03-21 |
| 6872323 | In situ plasma process to remove fluorine residues from the interior surfaces of a CVD reactor | William Robert Entley, Randy K. Hall | 2005-03-29 |
| 6837250 | CVD chamber cleaning using mixed PFCs from capture/recycle | Andrew David Johnson | 2005-01-04 |
| 6686594 | On-line UV-Visible light halogen gas analyzer for semiconductor processing effluent monitoring | Bing Ji, Robert Gordon Ridgeway, Eugene Joseph Karwacki, Jr., Howard Paul Withers, Jr., Steven Rogers +1 more | 2004-02-03 |
| 6637998 | Self evacuating micro environment system | Wayne Thomas McDermott, Thomas Hsiao-Ling Hsiung | 2003-10-28 |
| 6023933 | Ultra high pressure gases | Wayne Thomas McDermott, Richard Carl Ockovic | 2000-02-15 |
| 5910294 | Abatement of NF.sub.3 with metal oxalates | Howard Paul Withers, Jr. | 1999-06-08 |
| 5626775 | Plasma etch with trifluoroacetic acid and derivatives | David A. Roberts, Raymond Nicholas Vrtis, Arthur Kenneth Hochberg, Robert G. Bryant | 1997-05-06 |
| 5479727 | Moisture removal and passivation of surfaces | Stephen M. Fine, Andrew David Johnson | 1996-01-02 |
| 5413670 | Method for plasma etching or cleaning with diluted NF.sub.3 | Scott Edward Beck, Brian Felker | 1995-05-09 |