Issued Patents All Time
Showing 25 most recent of 28 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10465286 | Method and apparatus to help promote contact of gas with vaporized material | John N. Gregg, Scott L. Battle, Jeffrey I. Banton, Donn K. Naito | 2019-11-05 |
| 9469898 | Method and apparatus to help promote contact of gas with vaporized material | John N. Gregg, Scott L. Battle, Jeffrey I. Banton, Donn K. Naito | 2016-10-18 |
| 9004462 | Method and apparatus to help promote contact of gas with vaporized material | John N. Gregg, Scott L. Battle, Jeffrey I. Banton, Donn K. Naito | 2015-04-14 |
| 8444120 | Method and apparatus to help promote contact of gas with vaporized material | John N. Gregg, Scott L. Battle, Jeffrey I. Banton, Donn K. Naito | 2013-05-21 |
| 8227358 | Silicon precursors and method for low temperature CVD of silicon-containing films | Ziyun Wang, Ashutosh Misra | 2012-07-24 |
| 8153833 | Composition and method for low temperature deposition of silicon-containing films such as films including silicon, silicon nitride, silicon dioxide and/or silicon-oxynitride | Ziyun Wang, Chongying Xu, Thomas H. Baum, Bryan C. Hendrix, Jeffrey F. Roeder | 2012-04-10 |
| 8128073 | Method and apparatus to help promote contact of gas with vaporized material | John N. Gregg, Scott L. Battle, Jeffrey I. Banton, Donn K. Naito | 2012-03-06 |
| 8101788 | Silicon precursors and method for low temperature CVD of silicon-containing films | Ziyun Wang, Ashutosh Misra | 2012-01-24 |
| 8088938 | Low decomposition storage of a tantalum precursor | Nathan Stafford, Christian Dussarrat, Olivier Letessier | 2012-01-03 |
| 7910765 | Composition and method for low temperature deposition of silicon-containing films such as films including silicon, silicon nitride, silicon dioxide and/or silicon-oxynitride | Ziyun Wang, Chongying Xu, Thomas H. Baum, Bryan C. Hendrix, Jeffrey F. Roeder | 2011-03-22 |
| 7828274 | Method and apparatus to help promote contact of gas with vaporized material | John N. Gregg, Scott L. Battle, Jeffrey I. Banton, Donn K. Naito | 2010-11-09 |
| 7786320 | Composition and method for low temperature deposition of silicon-containing films such as films including silicon, silicon nitride, silicon dioxide and/or silicon-oxynitride | Ziyun Wang, Chongying Xu, Thomas H. Baum, Bryan C. Hendrix, Jeffrey F. Roeder | 2010-08-31 |
| 7770448 | Chemical storage device with integrated load cell | Ashutosh Misra, Benjamin Jurcik | 2010-08-10 |
| 7556244 | Method and apparatus to help promote contact of gas with vaporized material | John N. Gregg, Scott L. Battle, Jeffrey I. Banton, Donn K. Naito | 2009-07-07 |
| 7531679 | Composition and method for low temperature deposition of silicon-containing films such as films including silicon nitride, silicon dioxide and/or silicon-oxynitride | Ziyun Wang, Chongying Xu, Thomas H. Baum, Bryan C. Hendrix, Jeffrey F. Roeder | 2009-05-12 |
| 7487956 | Method and apparatus to help promote contact of gas with vaporized material | John N. Gregg, Scott L. Battle, Jeffrey I. Banton, Donn K. Naito | 2009-02-10 |
| 7423166 | Stabilized cyclosiloxanes for use as CVD precursors for low-dielectric constant thin films | Tianniu Chen, Chongying Xu, Thomas H. Baum, Alexander Borovik | 2008-09-09 |
| 7300038 | Method and apparatus to help promote contact of gas with vaporized material | John N. Gregg, Scott L. Battle, Jeffrey I. Banton, Donn K. Naito | 2007-11-27 |
| 7293569 | Alkylsilanes as solvents for low vapor pressure precursors | Ashutosh Misra, Jean-Marc Girard | 2007-11-13 |
| 7108771 | Method for removal of impurities in cyclic siloxanes useful as precursors for low dielectric constant thin films | Chongying Xu, Thomas H. Baum, Alexander Borovik, Ziyun Wang, James Lin +1 more | 2006-09-19 |
| 6963006 | Process for the production and purification of bis(tertiary-butylamino)silane | Yin Pang Tsui, Thomas Elwood Zellner, Rajiv Krishan Agarwal | 2005-11-08 |
| 6576345 | Dielectric films with low dielectric constants | Patrick A. Van Cleemput, Jen Shu, Michelle T. Schulberg, Bunsen B. Nie | 2003-06-10 |
| 6340628 | Method to deposit SiOCH films with dielectric constant below 3.0 | Patrick A. Van Cleemput, Jen Shu, Michelle T. Schulberg, Bunsen B. Nie | 2002-01-22 |
| 5976991 | Deposition of silicon dioxide and silicon oxynitride using bis(tertiarybutylamino) silane | David A. Roberts, Arthur Kenneth Hochberg | 1999-11-02 |
| 5902893 | Purification of organosilanes of group 13 (IIIA) and 15 (VA) impurities | — | 1999-05-11 |