Issued Patents All Time
Showing 1–25 of 29 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10370248 | Maximizing steam methane reformer combustion efficiency by pre-heating pre-reformed fuel gas | Taekyu Kang, Rong Fan, Pavol Pranda, Robert A. Gagliano | 2019-08-06 |
| 9878279 | System for purifying hydrogen from a metal hydride storage system | Pascal Tessier, Philippe A. Coignet, Ryan B. Adelman | 2018-01-30 |
| 9878278 | Method of purifying hydrogen from a metal hydride storage system | Pascal Tessier, Philippe A. Coignet, Ryan B. Adelman | 2018-01-30 |
| 9795927 | Manufacturing carbon molecular sieve membranes using a pyrolysis atmosphere comprising sulfur-containing compounds | Henri Chevrel, Philippe A. Coignet, Raja Swaidan, Dean W. Kratzer | 2017-10-24 |
| 9773683 | Atomic layer or cyclic plasma etching chemistries and processes | Rahul Gupta, Venkateswara R. Pallem | 2017-09-26 |
| 9206507 | Nickel bis diazabutadiene precursors, their synthesis, and their use for nickel containing films depositions | Clément Lansalot-Matras, Julien Gatineau | 2015-12-08 |
| 8758867 | Neutral ligand containing precursors and methods for deposition of a metal containing film | Christian Dussarrat | 2014-06-24 |
| 7770448 | Chemical storage device with integrated load cell | Ashutosh Misra, Ravi Laxman | 2010-08-10 |
| 7482286 | Method for forming dielectric or metallic films | Ashutosh Misra, Matthew Fisher, Christian Dussarrat, Eri Tsukada, Jean-Marc Girard | 2009-01-27 |
| 7098150 | Method for novel deposition of high-k MSiON dielectric films | Ashutosh Misra, Matthew Fisher | 2006-08-29 |
| 6885452 | Chamber effluent monitoring system and semiconductor processing system comprising absorption spectroscopy measurement system, and methods of use | James McAndrew, Hwa-Chi Wang | 2005-04-26 |
| 6493086 | Chamber effluent monitoring system and semiconductor processing system comprising absorption spectroscopy measurement system, and methods of use | James McAndrew, Hwa-Chi Wang | 2002-12-10 |
| 6442736 | Semiconductor processing system and method for controlling moisture level therein | Jean-Marc Girard, Jean-Michel Friedt, James McAndrew | 2002-08-27 |
| 6421127 | Method and system for preventing deposition on an optical component in a spectroscopic sensor | James McAndrew, Carol Schnepper, Ronald S. Inman, Dmitry Znamensky, Tracey Jacksier | 2002-07-16 |
| 6363728 | System and method for controlled delivery of liquefied gases from a bulk source | Richard J. Udischas, Hwa-Chi Wang, Robert G. Irwin | 2002-04-02 |
| 6363626 | Method and device for treating items stored in containers and storage apparatus equipped with such a device | Denis Fiorillo, Sebastien Charles | 2002-04-02 |
| 6171100 | Oxidizing oxygen-fuel burner firing for reducing NOx emissions from high temperature furnaces | Mahendra Joshi, Jean-Francois Simon | 2001-01-09 |
| 6154284 | Chamber effluent monitoring system and semiconductor processing system comprising absorption spectroscopy measurement system, and methods of use | James McAndrew, Hwa-Chi Wang | 2000-11-28 |
| 6122931 | System and method for delivery of a vapor phase product to a point of use | Joseph E. Paganessi, Richard J. Udischas, Hwa-Chi Wang, Kazuo Yokogi, Shinji Tomita | 2000-09-26 |
| 6076359 | System and method for controlled delivery of liquified gases | Richard J. Udischas, Hwa-Chi Wang | 2000-06-20 |
| 6032483 | System and method for delivery of a vapor phase product to a point of use | Joseph E. Paganessi, Richard J. Udischas, Hwa-Chi Wang | 2000-03-07 |
| 5963336 | Chamber effluent monitoring system and semiconductor processing system comprising absorption spectroscopy measurement system, and methods of use | James McAndrew, Hwa-Chi Wang | 1999-10-05 |
| 5954498 | Oxidizing oxygen-fuel burner firing for reducing NOx emissions from high temperature furnaces | Mahendra Joshi, Jean-Francois Simon | 1999-09-21 |
| 5761911 | System and method for controlled delivery of liquified gases | Richard J. Udischas, Hwa-Chi Wang | 1998-06-09 |
| 5714678 | Method for rapidly determining an impurity level in a gas source or a gas distribution system | James McAndrew, Dmitry Znamensky | 1998-02-03 |