Issued Patents All Time
Showing 25 most recent of 29 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10895012 | Zirconium, hafnium, titanium precursors and deposition of group 4 containing films using the same | Satoko Gatineau, Wontae Noh, Daehyeon Kim, Jean-Marc Girard | 2021-01-19 |
| 10465289 | Zirconium, hafnium, titanium precursors and deposition of group 4 containing films using the same | Satoko Gatineau, Daehyeon Kim, Wontae Noh, Jean-Marc Girard | 2019-11-05 |
| 10364259 | Zirconium, hafnium, titanium precursors and deposition of group 4 containing films using the same | Daehyeon Kim, Satoko Gatineau, Wontae Noh, Jean-Marc Girard | 2019-07-30 |
| 10337104 | Zirconium, hafnium, titanium precursors and deposition of group 4 containing films using the same | Satoko Gatineau, Wontae Noh, Daehyeon Kim, Jean-Marc Girard | 2019-07-02 |
| 10309010 | Cobalt-containing compounds, their synthesis, and use in cobalt-containing film deposition | Satoko Gatineau, Changhee Ko, Jean-Marc Girard | 2019-06-04 |
| 9790591 | Titanium-containing film forming compositions for vapor deposition of titanium-containing films | Changhee Ko, Clément Lansalot-Matras, Julien Lieffrig, Hana Ishii | 2017-10-17 |
| 9633838 | Vapor deposition of silicon-containing films using penta-substituted disilanes | Jean-Marc Girard, Changhee Ko, Ivan Oshchepkov, Kazutaka Yanagita, Shingo Okubo +1 more | 2017-04-25 |
| 9543144 | Vapor deposition of chalcogenide-containing films | Hana Ishii, Nathanaelle Schneider | 2017-01-10 |
| 9416443 | Method for the deposition of a ruthenium containing film using arene diazadiene ruthenium(0) precursors | Clément Lansalot-Matras | 2016-08-16 |
| 9240319 | Chalcogenide-containing precursors, methods of making, and methods of using the same for thin film deposition | Mao MINOURA, Hana Ishii | 2016-01-19 |
| 9206507 | Nickel bis diazabutadiene precursors, their synthesis, and their use for nickel containing films depositions | Clément Lansalot-Matras, Benjamin Jurcik | 2015-12-08 |
| 9187511 | Titanium-aluminum alloy deposition with titanium-tetrahydroaluminate bimetallic molecules | Satoko Gatineau, Jean-Marc Girard, Changhee Ko | 2015-11-17 |
| 9109281 | Metal heterocyclic compounds for deposition of thin films | Kazutaka Yanagita, Shingo Okubo | 2015-08-18 |
| 8859047 | Use of ruthenium tetroxide as a precursor and reactant for thin film depositions | Christian Dussarrat | 2014-10-14 |
| 8802194 | Tellurium precursors for film deposition | Hana Ishii | 2014-08-12 |
| 8753718 | Method for the deposition of a ruthenium-containing film | Christian Dussarrat | 2014-06-17 |
| 8691668 | Dihalide germanium(II) precursors for germanium-containing film depositions | Andreas Zauner, Hana Ishii | 2014-04-08 |
| 8658249 | Heteroleptic iridium precursors to be used for the deposition of iridium-containing films | Christian Dussarrat | 2014-02-25 |
| 8636845 | Metal heterocyclic compounds for deposition of thin films | Kazutaka Yanagita, Shingo Okubo | 2014-01-28 |
| 8613976 | Method of forming silicon oxide containing films | Christian Dussarrat, Ikuo Suzuki, Kazutaka Yanagita, Eri Tsukada | 2013-12-24 |
| 8557339 | Method for the deposition of a Ruthenium containing film | Christian Dussarrat | 2013-10-15 |
| 8546276 | Deposition of group IV metal-containing films at high temperature | Changhee Ko | 2013-10-01 |
| 8404306 | Method for the deposition of a ruthenium containing film | Christian Dussarrat | 2013-03-26 |
| 8309174 | Heteroleptic iridium precursors to be used for the deposition of iridium-containing films | Christian Dussarrat | 2012-11-13 |
| 8227032 | Method of forming silicon oxide containing films | Christian Dussarrat, Kazutaka Yanagita, Eri Tsukada, Ikuo Suzuki | 2012-07-24 |