Issued Patents All Time
Showing 25 most recent of 89 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12404585 | Lithium precursors for deposition of lithium-containing layers, islets or clusters | Keishi YAMAMOTO, Nicolas Blasco, Sunao KAMIMURA | 2025-09-02 |
| 12368152 | Compound and method for producing lithium-containing film | Vincent Duplan, Yumi Ikeda | 2025-07-22 |
| 12065453 | Lanthanoid compound, lanthanoid-containing thin film and formation of lanthanoid-containing thin film using the lanthanoid compound | Takashi Ono, Tomohiro Seki | 2024-08-20 |
| 11859283 | Heteroalkylcyclopentadienyl indium-containing precursors and processes of using the same for deposition of indium-containing layers | Antoine Bruneau, Takashi Ono | 2024-01-02 |
| 11549182 | Group 6 transition metal-containing compounds for vapor deposition of group 6 transition metal-containing films | Clément Lansalot-Matras, Julien Lieffrig, Antoine COLAS, Jong Min Kim | 2023-01-10 |
| 11162175 | Group 6 transition metal-containing compounds for vapor deposition of group 6 transition metal-containing films | Clément Lansalot-Matras, Julien Lieffrig, Antoine COLAS, Jong Min Kim | 2021-11-02 |
| 11152223 | Fluorocarbon molecules for high aspect ratio oxide etch | Curtis Anderson, Rahul Gupta, Vincent M. Omarjee, Nathan Stafford | 2021-10-19 |
| 10731251 | Group 6 transition metal-containing compounds for vapor deposition of group 6 transition metal-containing films | Clément Lansalot-Matras, Julien Lieffrig, Antoine COLAS, Jong Min Kim | 2020-08-04 |
| 10720335 | Chemistries for TSV/MEMS/power device etching | Peng Shen, Curtis Anderson, Rahul Gupta, Vincent M. Omarjee, Nathan Stafford | 2020-07-21 |
| 10381240 | Fluorocarbon molecules for high aspect ratio oxide etch | Curtis Anderson, Rahul Gupta, Vincent M. Omarjee, Nathan Stafford | 2019-08-13 |
| 10217629 | Method of forming dielectric films, new precursors and their use in semiconductor manufacturing | Nicolas Blasco, Audrey Pinchart, Christophe Lachaud | 2019-02-26 |
| 10106568 | Hafnium-containing film forming compositions for vapor deposition of hafnium-containing films | Jean-Marc Girard, Hana Ishii, Clément Lansalot-Matras, Julien Lieffrig | 2018-10-23 |
| 10103031 | Chemistries for TSV/MEMS/power device etching | Peng Shen, Curtis Anderson, Rahul Gupta, Vincent M. Omarjee, Nathan Stafford | 2018-10-16 |
| 10094021 | Group 6 transition metal-containing compounds for vapor deposition of group 6 transition metal-containing films | Clément Lansalot-Matras, Julien Lieffrig, Antoine COLAS, Jong Min Kim | 2018-10-09 |
| 9938303 | Organosilane precursors for ALD/CVD silicon-containing film applications | Glenn Kuchenbeiser, Venkateswara R. Pallem | 2018-04-10 |
| 9911590 | Methods of forming dielectric films, new precursors and their use in semiconductor manufacturing | Nicolas Blasco, Audrey Pinchart, Christophe Lachaud | 2018-03-06 |
| 9892932 | Chemistries for TSV/MEMS/power device etching | Peng Shen, Curtis Anderson, Rahul Gupta, Vincent M. Omarjee, Nathan Stafford | 2018-02-13 |
| 9868753 | Germanium- and zirconium-containing composition for vapor deposition of zirconium-containing films | Clément Lansalot-Matras, Julien Lieffrig, Hana Ishii | 2018-01-16 |
| 9822132 | Hexacoordinate silicon-containing precursors for ALD/CVD silicon-containing film applications | Glenn Kuchenbeiser, Venkateswara R. Pallem | 2017-11-21 |
| 9719167 | Cobalt-containing film forming compositions, their synthesis, and use in film deposition | Satoko Gatineau, Mikiko Kimura, Jean-Marc Girard, Nicolas Blasco | 2017-08-01 |
| 9711347 | Preparation of lanthanide-containing precursors and deposition of lanthanide-containing films | Venkateswara R. Pallem, Wontae Noh | 2017-07-18 |
| 9663547 | Silicon- and Zirconium-containing compositions for vapor deposition of Zirconium-containing films | Clément Lansalot-Matras, Julien Lieffrig, Hana Ishii | 2017-05-30 |
| 9593133 | Organosilane precursors for ALD/CVD silicon-containing film applications | Glenn Kuchenbeiser, Venkateswara R. Pallem | 2017-03-14 |
| 9583335 | Method of forming dielectric films, new precursors and their use in semiconductor manufacturing | Nicolas Blasco, Audrey Pinchart, Christophe Lachaud | 2017-02-28 |
| 9514959 | Fluorocarbon molecules for high aspect ratio oxide etch | Curtis Anderson, Rahul Gupta, Vincent M. Omarjee, Nathan Stafford | 2016-12-06 |