Issued Patents All Time
Showing 26–50 of 89 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9499571 | Germanium- and zirconium-containing compositions for vapor deposition of zirconium-containing films | Clément Lansalot-Matras, Julien Lieffrig, Hana Ishii | 2016-11-22 |
| 9384963 | Preparation of cerium-containing precursor and deposition of cerium-containing films | Venkateswara R. Pallem, Wontae Noh | 2016-07-05 |
| 9371338 | Organosilane precursors for ALD/CVD silicon-containing film applications | Glenn Kuchenbeiser, Venkateswara R. Pallem | 2016-06-21 |
| RE45839 | Pentakis(dimethylamino) disilane precursor comprising compound and method for the preparation thereof | — | 2016-01-12 |
| 9121093 | Bis-ketoiminate copper precursors for deposition of copper-containing films and methods thereof | Clément Lansalot-Matras, Vincent M. Omarjee, Andrey V. Korolev | 2015-09-01 |
| 9103019 | Metal precursors containing beta-diketiminato ligands | Benjamin J. Feist | 2015-08-11 |
| 9087690 | Hafnium-containing and zirconium-containing precursors for vapor deposition | Venkateswara R. Pallem | 2015-07-21 |
| 9076648 | Preparation of lanthanide-containing precursors and deposition of lanthanide-containing films | Venkateswara R. Pallem | 2015-07-07 |
| 9064694 | Nitridation of atomic layer deposited high-k dielectrics using trisilylamine | Steven P. Consiglio, Robert D. Clark, Vincent M. Omarjee, Venkat Pallem, Glenn Kuchenbeiser | 2015-06-23 |
| 9045509 | Hafnium- and zirconium-containing precursors and methods of using the same | Vincent M. Omarjee, Venkateswara R. Pallem | 2015-06-02 |
| 8999734 | Cyclic amino compounds for low-k silylation | James McAndrew, Curtis Anderson | 2015-04-07 |
| 8974758 | Methods of purifying COS | Asli Ertan, Nathan Stafford, Dmitri Znamensky | 2015-03-10 |
| 8932674 | Vapor deposition methods of SiCOH low-k films | Francois Doniat, Curtis Anderson, James McAndrew | 2015-01-13 |
| 8906457 | Method of atomic layer deposition using metal precursors | David Thompson, Jeffrey W. Anthis, Clément Lansalot-Matras | 2014-12-09 |
| 8859047 | Use of ruthenium tetroxide as a precursor and reactant for thin film depositions | Julien Gatineau | 2014-10-14 |
| 8853075 | Method for forming a titanium-containing layer on a substrate using an atomic layer deposition (ALD) process | Satoko Gatineau, Christophe Lachaud, Nicolas Blasco, Audrey Pinchart, Ziyun Wang +2 more | 2014-10-07 |
| 8852460 | Alkali earth metal precursors for depositing calcium and strontium containing films | Olivier Letessier, Benjamin J. Feist, Vincent M. Omarjee | 2014-10-07 |
| 8809849 | Preparation of cerium-containing precursors and deposition of cerium-containing films | Venkateswara R. Pallem, Wontae Noh | 2014-08-19 |
| 8765220 | Methods of making and deposition methods using hafnium- or zirconium-containing compounds | Vincent M. Omarjee, Venkateswara R. Pallem | 2014-07-01 |
| 8758867 | Neutral ligand containing precursors and methods for deposition of a metal containing film | Benjamin Jurcik | 2014-06-24 |
| 8753718 | Method for the deposition of a ruthenium-containing film | Julien Gatineau | 2014-06-17 |
| 8668957 | Method of forming dielectric films, new precursors and their use in semiconductor manufacturing | Nicolas Blasco, Audrey Pinchart, Christophe Lachaud | 2014-03-11 |
| 8664446 | Purification of trimethylamine | Brian Besancon, Nathan Stafford, Paul Jantzen | 2014-03-04 |
| 8658249 | Heteroleptic iridium precursors to be used for the deposition of iridium-containing films | Julien Gatineau | 2014-02-25 |
| 8633329 | Titanium-containing precursors for vapor deposition | Venkateswara R. Pallem | 2014-01-21 |