Issued Patents All Time
Showing 1–10 of 10 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10217629 | Method of forming dielectric films, new precursors and their use in semiconductor manufacturing | Christian Dussarrat, Nicolas Blasco, Christophe Lachaud | 2019-02-26 |
| 9911590 | Methods of forming dielectric films, new precursors and their use in semiconductor manufacturing | Christian Dussarrat, Nicolas Blasco, Christophe Lachaud | 2018-03-06 |
| 9583335 | Method of forming dielectric films, new precursors and their use in semiconductor manufacturing | Christian Dussarrat, Nicolas Blasco, Christophe Lachaud | 2017-02-28 |
| 9085823 | Method of forming a tantalum-containing layer on a substrate | Nicolas Blasco, Anthony Correia-Anacleto, Andreas Zauner, Ziyun Wang | 2015-07-21 |
| 9040372 | Niobium and vanadium organometallic precursors for thin film deposition | Nicolas Blasco, Antony Correia-Anacleto, Andreas Zauner | 2015-05-26 |
| 8853075 | Method for forming a titanium-containing layer on a substrate using an atomic layer deposition (ALD) process | Satoko Gatineau, Christian Dussarrat, Christophe Lachaud, Nicolas Blasco, Ziyun Wang +2 more | 2014-10-07 |
| 8668957 | Method of forming dielectric films, new precursors and their use in semiconductor manufacturing | Christian Dussarrat, Nicolas Blasco, Christophe Lachaud | 2014-03-11 |
| 8470402 | Method of depositing a metal-containing dielectric film | Christian Dussarrat, Nicolas Blasco, Christophe Lachaud | 2013-06-25 |
| 8460989 | Niobium and vanadium organometallic precursors for thin film deposition | Nicolas Blasco, Anthony Correia-Anacleto, Andreas Zauner | 2013-06-11 |
| 8324014 | Process for depositing boron compounds by CVD or PVD | Denis Jahan | 2012-12-04 |