Issued Patents All Time
Showing 1–25 of 36 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12327732 | Method to improve profile control during selective etching of silicon nitride spacers | Xiangyu Guo, James Royer, Nathan Stafford | 2025-06-10 |
| 12187853 | Silicon-based self-assembling monolayer compositions and surface preparation using the same | Jean-Marc Girard, Nicolas Blasco, Claudia Fafard, Fabrizio Marchegiani | 2025-01-07 |
| 11837474 | Method to improve profile control during selective etching of silicon nitride spacers | Xiangyu Guo, James Royer, Nathan Stafford | 2023-12-05 |
| 11821080 | Reagents to remove oxygen from metal oxyhalide precursors in thin film deposition processes | Yumin Liu, Rocio Alejandra Arteaga Muller, Nicolas Blasco, Jean-Marc Girard, Feng Li +1 more | 2023-11-21 |
| 11784041 | Preparation of lanthanide-containing precursors and deposition of lanthanide-containing films | Daehyeon Kim, Junhyun Song, Wontae Noh | 2023-10-10 |
| 11469110 | Method to improve profile control during selective etching of silicon nitride spacers | Xiangyu Guo, James Royer, Nathan Stafford | 2022-10-11 |
| 11430663 | Iodine-containing compounds for etching semiconductor structures | Vijay Surla, Rahul Gupta, Hui SUN, Nathan Stafford, Fabrizio Marchegiani +2 more | 2022-08-30 |
| 10629451 | Method to improve profile control during selective etching of silicon nitride spacers | Xiangyu Guo, James Royer, Nathan Stafford | 2020-04-21 |
| 10607850 | Iodine-containing compounds for etching semiconductor structures | Vijay Surla, Rahul Gupta, Hui SUN, Nathan Stafford, Fabrizio Marchegiani +2 more | 2020-03-31 |
| 10256109 | Nitrogen-containing compounds for etching semiconductor structures | Vijay Surla, Rahul Gupta | 2019-04-09 |
| 10217681 | Gases for low damage selective silicon nitride etching | James Royer, Rahul Gupta | 2019-02-26 |
| 10115600 | Method of etching semiconductor structures with etch gas | Rahul Gupta, Vijay Surla, Curtis Anderson, Nathan Stafford | 2018-10-30 |
| 10053775 | Methods of using amino(bromo)silane precursors for ALD/CVD silicon-containing film applications | Glenn Kuchenbeiser, Nicolas Blasco, Jean-Marc Girard | 2018-08-21 |
| 10006122 | Organodisilane precursors for ALD/CVD silicon-containing film applications | Guillaume Husson, Glenn Kuchenbeiser | 2018-06-26 |
| 9969756 | Carbosilane substituted amine precursors for deposition of Si-containing films and methods thereof | Claudia Fafard, Jean-Marc Girard | 2018-05-15 |
| 9938303 | Organosilane precursors for ALD/CVD silicon-containing film applications | Christian Dussarrat, Glenn Kuchenbeiser | 2018-04-10 |
| 9822132 | Hexacoordinate silicon-containing precursors for ALD/CVD silicon-containing film applications | Glenn Kuchenbeiser, Christian Dussarrat | 2017-11-21 |
| 9773679 | Method of etching semiconductor structures with etch gas | Rahul Gupta, Vijay Surla, Curtis Anderson, Nathan Stafford | 2017-09-26 |
| 9773683 | Atomic layer or cyclic plasma etching chemistries and processes | Rahul Gupta, Benjamin Jurcik | 2017-09-26 |
| 9711347 | Preparation of lanthanide-containing precursors and deposition of lanthanide-containing films | Christian Dussarrat, Wontae Noh | 2017-07-18 |
| 9701695 | Synthesis methods for amino(halo)silanes | Glenn Kuchenbeiser, Guillaume Husson | 2017-07-11 |
| 9659788 | Nitrogen-containing compounds for etching semiconductor structures | Vijay Surla, Rahul Gupta | 2017-05-23 |
| 9593133 | Organosilane precursors for ALD/CVD silicon-containing film applications | Christian Dussarrat, Glenn Kuchenbeiser | 2017-03-14 |
| 9382268 | Sulfur containing organosilane precursors for ALD/CVD silicon-containing film applications | Glenn Kuchenbeiser | 2016-07-05 |
| 9384963 | Preparation of cerium-containing precursor and deposition of cerium-containing films | Christian Dussarrat, Wontae Noh | 2016-07-05 |