Issued Patents All Time
Showing 1–8 of 8 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12272562 | Oxygen and iodine-containing hydrofluorocarbon compound for etching semiconductor structures | — | 2025-04-08 |
| 12187853 | Silicon-based self-assembling monolayer compositions and surface preparation using the same | Venkateswara R. Pallem, Jean-Marc Girard, Nicolas Blasco, Claudia Fafard | 2025-01-07 |
| 12188123 | Deposition of iodine-containing carbon films | Phong Nguyen, Nathan Stafford, Xiangyu Guo | 2025-01-07 |
| 11798811 | Iodine-containing fluorocarbon and hydrofluorocarbon compounds for etching semiconductor structures | — | 2023-10-24 |
| 11499014 | Cureable formulations for forming low-k dielectric silicon-containing films using polycarbosilazane | Yumin Liu, Jean-Marc Girard, Peng Zhang, Fan QIN, Gennadiy Itov +1 more | 2022-11-15 |
| 11430663 | Iodine-containing compounds for etching semiconductor structures | Vijay Surla, Rahul Gupta, Hui SUN, Venkateswara R. Pallem, Nathan Stafford +2 more | 2022-08-30 |
| 10607850 | Iodine-containing compounds for etching semiconductor structures | Vijay Surla, Rahul Gupta, Hui SUN, Venkateswara R. Pallem, Nathan Stafford +2 more | 2020-03-31 |
| 10410878 | Hydrofluorocarbons containing —NH2 functional group for 3D NAND and DRAM applications | Hui SUN, James Royer, Nathan Stafford, Rahul Gupta | 2019-09-10 |