VO

Vincent M. Omarjee

AL American Air Liquide: 17 patents #10 of 326Top 4%
AL Air Liquide Electronics U.S. Lp: 6 patents #3 of 60Top 5%
AI Airgas: 1 patents #15 of 55Top 30%
TL Tokyo Electron Limited: 1 patents #3,538 of 5,567Top 65%
📍 Menlo Park, CA: #464 of 3,774 inventorsTop 15%
🗺 California: #32,725 of 386,348 inventorsTop 9%
Overall (All Time): #251,566 of 4,157,543Top 7%
18
Patents All Time

Issued Patents All Time

Showing 1–18 of 18 patents

Patent #TitleCo-InventorsDate
11679156 Use of stable isotopes to prove authentication of manufacturing location Tracey Jacksier, Mani C. Matthew, Anthony W. Reccek, Jr., Martin Vasarhelyi 2023-06-20
11430663 Iodine-containing compounds for etching semiconductor structures Vijay Surla, Rahul Gupta, Hui SUN, Venkateswara R. Pallem, Nathan Stafford +2 more 2022-08-30
11152223 Fluorocarbon molecules for high aspect ratio oxide etch Curtis Anderson, Rahul Gupta, Nathan Stafford, Christian Dussarrat 2021-10-19
10720335 Chemistries for TSV/MEMS/power device etching Peng Shen, Christian Dussarrat, Curtis Anderson, Rahul Gupta, Nathan Stafford 2020-07-21
10607850 Iodine-containing compounds for etching semiconductor structures Vijay Surla, Rahul Gupta, Hui SUN, Venkateswara R. Pallem, Nathan Stafford +2 more 2020-03-31
10381240 Fluorocarbon molecules for high aspect ratio oxide etch Curtis Anderson, Rahul Gupta, Nathan Stafford, Christian Dussarrat 2019-08-13
10103031 Chemistries for TSV/MEMS/power device etching Peng Shen, Christian Dussarrat, Curtis Anderson, Rahul Gupta, Nathan Stafford 2018-10-16
9892932 Chemistries for TSV/MEMS/power device etching Peng Shen, Christian Dussarrat, Curtis Anderson, Rahul Gupta, Nathan Stafford 2018-02-13
9514959 Fluorocarbon molecules for high aspect ratio oxide etch Curtis Anderson, Rahul Gupta, Nathan Stafford, Christian Dussarrat 2016-12-06
9121093 Bis-ketoiminate copper precursors for deposition of copper-containing films and methods thereof Christian Dussarrat, Clément Lansalot-Matras, Andrey V. Korolev 2015-09-01
9064694 Nitridation of atomic layer deposited high-k dielectrics using trisilylamine Steven P. Consiglio, Robert D. Clark, Christian Dussarrat, Venkat Pallem, Glenn Kuchenbeiser 2015-06-23
9045509 Hafnium- and zirconium-containing precursors and methods of using the same Christian Dussarrat, Venkateswara R. Pallem 2015-06-02
8852460 Alkali earth metal precursors for depositing calcium and strontium containing films Olivier Letessier, Christian Dussarrat, Benjamin J. Feist 2014-10-07
8765220 Methods of making and deposition methods using hafnium- or zirconium-containing compounds Christian Dussarrat, Venkateswara R. Pallem 2014-07-01
8367531 Aluminum implant using new compounds Christian Dussarrat, Jean-Marc Girard, Nicolas Blasco 2013-02-05
8349738 Metal precursors for deposition of metal-containing films Clément Lansalot-Matras, Christian Dussarrat, Cheng-Fang Hsiao 2013-01-08
8343860 High C content molecules for C implant Christian Dussarrat, Jean-Marc Girard, Nicolas Blasco 2013-01-01
8076243 Metal precursors for deposition of metal-containing films Christian Dussarrat, Clément Lansalot-Matras, Cheng-Fang Hsiao 2011-12-13