Issued Patents All Time
Showing 1–22 of 22 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12431388 | Conformal titanium silicon nitride-based thin films and methods of forming same | Hae Young Kim, Hyunchol Cho, Ajit Dhamdhere | 2025-09-30 |
| 12308226 | Conformal and smooth titanium nitride layers and methods of forming the same | Sung Hoon Jung, Niloy Mukherjee, Yoshikazu Okuyama, Nariman Naghibolashrafi, Hae Young Kim +1 more | 2025-05-20 |
| 12283486 | Conformal and smooth titanium nitride layers and methods of forming the same | Hyunchol Cho, Hae Young Kim | 2025-04-22 |
| 12272599 | Conformal and smooth titanium nitride layers and methods of forming the same | Hyunchol Cho, Hae Young Kim, Ajit Dhamdhere, Sung Hoon Jung | 2025-04-08 |
| 12165918 | Conformal titanium nitride-based thin films and methods of forming same | Niloy Mukherjee, Hae Young Kim, Jerry Mack, Jae Seok Heo, Sung Hoon Jung +4 more | 2024-12-10 |
| 11587784 | Smooth titanium nitride layers and methods of forming the same | Sung Hoon Jung, Niloy Mukherjee, Hee Seok Kim, Kyu Jin Choi, Moonsig Joo +4 more | 2023-02-21 |
| 11482413 | Conformal and smooth titanium nitride layers and methods of forming the same | Sung Hoon Jung, Niloy Mukherjee, Yoshikazu Okuyama, Nariman Naghibolashrafi, Hae Young Kim +1 more | 2022-10-25 |
| 11361992 | Conformal titanium nitride-based thin films and methods of forming same | Niloy Mukherjee, Hae Young Kim, Jerry Mack, Jae Seok Heo, Sung Hoon Jung +4 more | 2022-06-14 |
| 7790633 | Sequential deposition/anneal film densification method | Raihan M. Tarafdar, George D. Papasouliotis, Ron Rulkens, Dennis M. Hausmann, Jeff Tobin +1 more | 2010-09-07 |
| 7700155 | Method and apparatus for modulation of precursor exposure during a pulsed deposition process | Francisco Juarez, Dennis M. Hausmann, Teresa Pong, Adrianne K. Tipton, Patrick A. Van Cleemput | 2010-04-20 |
| 7678709 | Method of forming low-temperature conformal dielectric films | Brian Lu, Wai-Fan Yau, Collin Kwok Leung Mui, Raihan M. Tarafdar | 2010-03-16 |
| 7482247 | Conformal nanolaminate dielectric deposition and etch bag gap fill process | George D. Papasouliotis, Raihan M. Tarafdar, Ron Rulkins, Dennis M. Hausmann, Jeff Tobin +5 more | 2009-01-27 |
| 7297608 | Method for controlling properties of conformal silica nanolaminates formed by rapid vapor deposition | George D. Papasouliotis, Raihan M. Tarafdar, Ron Rulkens, Dennis M. Hausmann, Jeff Tobin +1 more | 2007-11-20 |
| 7294583 | Methods for the use of alkoxysilanol precursors for vapor deposition of SiO2 films | Ron Rulkens, George D. Papasouliotis, Dennis M. Hausmann, Raihan M. Tarafdar, Adrianne K. Tipton +1 more | 2007-11-13 |
| 7223707 | Dynamic rapid vapor deposition process for conformal silica laminates | George D. Papasouliotis, Jeff Tobin, Ron Rulkens, Dennis M. Hausmann, Adrianne K. Tipton +1 more | 2007-05-29 |
| 7202185 | Silica thin films produced by rapid surface catalyzed vapor deposition (RVD) using a nucleation layer | Dennis M. Hausmann, Jeff Tobin, George D. Papasouliotis, Ron Rulkens, Raihan M. Tarafdar +1 more | 2007-04-10 |
| 7148155 | Sequential deposition/anneal film densification method | Raihan M. Tarafdar, George D. Papasouliotis, Ron Rulkens, Dennis M. Hausmann, Jeff Tobin +1 more | 2006-12-12 |
| 7129189 | Aluminum phosphate incorporation in silica thin films produced by rapid surface catalyzed vapor deposition (RVD) | Dennis M. Hausmann, Adrianne K. Tipton, George D. Papasouliotis, Ron Rulkens, Raihan M. Tarafdar | 2006-10-31 |
| 7097878 | Mixed alkoxy precursors and methods of their use for rapid vapor deposition of SiO2 films | Ron Rulkens, Dennis M. Hausmann, Raihan M. Tarafdar, George D. Papasouliotis, Adrianne K. Tipton +1 more | 2006-08-29 |
| 6867152 | Properties of a silica thin film produced by a rapid vapor deposition (RVD) process | Dennis M. Hausmann, Adrianne K. Tipton, Patrick A. Van Cleemput, Francisco Juarez, Teresa Pong | 2005-03-15 |
| 6576345 | Dielectric films with low dielectric constants | Patrick A. Van Cleemput, Ravi Laxman, Jen Shu, Michelle T. Schulberg | 2003-06-10 |
| 6340628 | Method to deposit SiOCH films with dielectric constant below 3.0 | Patrick A. Van Cleemput, Ravi Laxman, Jen Shu, Michelle T. Schulberg | 2002-01-22 |