Issued Patents All Time
Showing 1–18 of 18 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7790633 | Sequential deposition/anneal film densification method | Raihan M. Tarafdar, George D. Papasouliotis, Ron Rulkens, Dennis M. Hausmann, Jeff Tobin +1 more | 2010-09-07 |
| 7700155 | Method and apparatus for modulation of precursor exposure during a pulsed deposition process | Francisco Juarez, Dennis M. Hausmann, Bunsen B. Nie, Teresa Pong, Patrick A. Van Cleemput | 2010-04-20 |
| 7482247 | Conformal nanolaminate dielectric deposition and etch bag gap fill process | George D. Papasouliotis, Raihan M. Tarafdar, Ron Rulkins, Dennis M. Hausmann, Jeff Tobin +5 more | 2009-01-27 |
| 7297608 | Method for controlling properties of conformal silica nanolaminates formed by rapid vapor deposition | George D. Papasouliotis, Raihan M. Tarafdar, Ron Rulkens, Dennis M. Hausmann, Jeff Tobin +1 more | 2007-11-20 |
| 7294583 | Methods for the use of alkoxysilanol precursors for vapor deposition of SiO2 films | Ron Rulkens, George D. Papasouliotis, Dennis M. Hausmann, Raihan M. Tarafdar, Bunsen B. Nie +1 more | 2007-11-13 |
| 7271112 | Methods for forming high density, conformal, silica nanolaminate films via pulsed deposition layer in structures of confined geometry | George D. Papasouliotis, Raihan M. Tarafdar, Ron Rulkens, Dennis M. Hausmann, Jeff Tobin | 2007-09-18 |
| 7223707 | Dynamic rapid vapor deposition process for conformal silica laminates | George D. Papasouliotis, Jeff Tobin, Ron Rulkens, Dennis M. Hausmann, Raihan M. Tarafdar +1 more | 2007-05-29 |
| 7208389 | Method of porogen removal from porous low-k films using UV radiation | Brian Lu, Patrick A. Van Cleemput, Michelle T. Schulberg, Qingguo Wu, Haiying Fu +1 more | 2007-04-24 |
| 7202185 | Silica thin films produced by rapid surface catalyzed vapor deposition (RVD) using a nucleation layer | Dennis M. Hausmann, Jeff Tobin, George D. Papasouliotis, Ron Rulkens, Raihan M. Tarafdar +1 more | 2007-04-10 |
| 7148155 | Sequential deposition/anneal film densification method | Raihan M. Tarafdar, George D. Papasouliotis, Ron Rulkens, Dennis M. Hausmann, Jeff Tobin +1 more | 2006-12-12 |
| 7129189 | Aluminum phosphate incorporation in silica thin films produced by rapid surface catalyzed vapor deposition (RVD) | Dennis M. Hausmann, Bunsen B. Nie, George D. Papasouliotis, Ron Rulkens, Raihan M. Tarafdar | 2006-10-31 |
| 7097878 | Mixed alkoxy precursors and methods of their use for rapid vapor deposition of SiO2 films | Ron Rulkens, Dennis M. Hausmann, Raihan M. Tarafdar, George D. Papasouliotis, Bunsen B. Nie +1 more | 2006-08-29 |
| 6905556 | Method and apparatus for using surfactants in supercritical fluid processing of wafers | Raashina Humayun, Patrick Joyce, Krishnan Shrinivasan, Dennis W. Hess, Satyanarayana Myneni +1 more | 2005-06-14 |
| 6867152 | Properties of a silica thin film produced by a rapid vapor deposition (RVD) process | Dennis M. Hausmann, Patrick A. Van Cleemput, Bunsen B. Nie, Francisco Juarez, Teresa Pong | 2005-03-15 |
| 6848455 | Method and apparatus for removing photoresist and post-etch residue from semiconductor substrates by in-situ generation of oxidizing species | Krishnan Shrinivasan | 2005-02-01 |
| 6800142 | Method for removing photoresist and post-etch residue using activated peroxide followed by supercritical fluid treatment | Krishnan Shrinivasan, Souvik Banerjee, Raashina Humayun, Patrick Joyce | 2004-10-05 |
| 6764552 | Supercritical solutions for cleaning photoresist and post-etch residue from low-k materials | Patrick Joyce, Krishnan Shrinivasan, Dennis W. Hess, Satyanarayana Myneni, Galit Levitin | 2004-07-20 |
| 6715498 | Method and apparatus for radiation enhanced supercritical fluid processing | Raashina Humayun, Patrick Joyce, Vishal Gauri | 2004-04-06 |