Issued Patents All Time
Showing 1–16 of 16 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8362571 | High compressive stress carbon liners for MOS devices | James S. Sims, Mandyam Sriram, Seshasayee Varadarajan, Haiying Fu, Pramod Subramonium +2 more | 2013-01-29 |
| 7998881 | Method for making high stress boron-doped carbon films | James S. Sims, Mandyam Sriram, Seshasayee Varadarajan, Akhil Singhal | 2011-08-16 |
| 7923385 | Methods for producing low stress porous and CDO low-K dielectric materials using precursors with organic functional groups | Haiying Fu | 2011-04-12 |
| 7906174 | PECVD methods for producing ultra low-k dielectric films using UV treatment | Easwar Srinivasan, Dan Vitkavage | 2011-03-15 |
| 7906817 | High compressive stress carbon liners for MOS devices | James S. Sims, Mandyam Sriram, Seshasayee Varadarajan, Haiying Fu, Pramod Subramonium +2 more | 2011-03-15 |
| 7799705 | Methods for producing low stress porous low-k dielectric materials using precursors with organic functional groups | Haiying Fu, David Craig Smith, David Mordo | 2010-09-21 |
| 7781351 | Methods for producing low-k carbon doped oxide films with low residual stress | Haiying Fu, Dong Niu, Ananda K. Bandyopadhyay, David Mordo | 2010-08-24 |
| 7737525 | Method for producing low-K CDO films | Haiying Fu, Xingyuan Tang | 2010-06-15 |
| 7622400 | Method for improving mechanical properties of low dielectric constant materials | Keith Fox, Easwar Srinivasan, David Mordo | 2009-11-24 |
| 7473653 | Methods for producing low stress porous low-k dielectric materials using precursors with organic functional groups | Haiying Fu, David Craig Smith, David Mordo | 2009-01-06 |
| 7390537 | Methods for producing low-k CDO films with low residual stress | Dong Niu, Haiying Fu | 2008-06-24 |
| 7341761 | Methods for producing low-k CDO films | Haiying Fu, Xingyuan Tang | 2008-03-11 |
| 7326444 | Methods for improving integration performance of low stress CDO films | Dong Niu, Honghong Wang, Haiying Fu | 2008-02-05 |
| 7241704 | Methods for producing low stress porous low-k dielectric materials using precursors with organic functional groups | Haiying Fu, David Craig Smith, David Mordo | 2007-07-10 |
| 7208389 | Method of porogen removal from porous low-k films using UV radiation | Adrianne K. Tipton, Brian Lu, Patrick A. Van Cleemput, Michelle T. Schulberg, Haiying Fu +1 more | 2007-04-24 |
| 7112615 | Porous material formation by chemical vapor deposition onto colloidal crystal templates | Karen K. Gleason, April D. Ross | 2006-09-26 |