Issued Patents All Time
Showing 1–14 of 14 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| D1000925 | Outside corner mud plastering tool | Ivan Juarez | 2023-10-10 |
| 9918376 | Hybrid impedance matching for inductively coupled plasma system | George Thomas, Panya Wongsenakhum | 2018-03-13 |
| 9707149 | Folding walker | — | 2017-07-18 |
| 9554961 | Folding walker | — | 2017-01-31 |
| 9362163 | Methods and apparatuses for atomic layer cleaning of contacts and vias | Michal Danek, Juwen Gao, Aaron R. Fellis, Chiukin Steven Lai | 2016-06-07 |
| 9082589 | Hybrid impedance matching for inductively coupled plasma system | George Thomas, Panya Wongsenakhum | 2015-07-14 |
| 7700155 | Method and apparatus for modulation of precursor exposure during a pulsed deposition process | Dennis M. Hausmann, Bunsen B. Nie, Teresa Pong, Adrianne K. Tipton, Patrick A. Van Cleemput | 2010-04-20 |
| 7695597 | Conductive planarization assembly for electrochemical mechanical planarization of a work piece | John Drewery, Henner Meinhold | 2010-04-13 |
| 7503334 | Apparatus and methods for processing semiconductor substrates using supercritical fluids | Krishnan Shrinivasan, Souvik Banerjee, Karen A. Reinhardt, Sanjay Gopinath | 2009-03-17 |
| 7391086 | Conductive contacts and methods for fabricating conductive contacts for elctrochemical planarization of a work piece | John Drewery, Henner Meinhold | 2008-06-24 |
| 6951765 | Method and apparatus for introduction of solid precursors and reactants into a supercritical fluid reactor | Sanjay Gopinath, Patrick A. Van Cleemput, Michelle T. Schulberg, Sasangan Ramanathan, Patrick Joyce | 2005-10-04 |
| 6867152 | Properties of a silica thin film produced by a rapid vapor deposition (RVD) process | Dennis M. Hausmann, Adrianne K. Tipton, Patrick A. Van Cleemput, Bunsen B. Nie, Teresa Pong | 2005-03-15 |
| 6848458 | Apparatus and methods for processing semiconductor substrates using supercritical fluids | Krishnan Shrinivasan, Souvik Banerjee, Karen A. Reinhardt, Sanjay Gopinath | 2005-02-01 |
| 6550484 | Apparatus for maintaining wafer back side and edge exclusion during supercritical fluid processing | Sanjay Gopinath, Patrick A. Van Cleemput, Krishnan Shrinivasan | 2003-04-22 |