RT

Raihan M. Tarafdar

NS Novellus Systems: 12 patents #69 of 780Top 9%
Lam Research: 2 patents #1,015 of 2,128Top 50%
🗺 California: #43,449 of 386,348 inventorsTop 15%
Overall (All Time): #347,856 of 4,157,543Top 9%
14
Patents All Time

Issued Patents All Time

Showing 1–14 of 14 patents

Patent #TitleCo-InventorsDate
10229826 Systems and methods for forming low resistivity metal contacts and interconnects by reducing and removing metallic oxide Shruti Vivek Thombare, Jeong-Seok Na, Raashina Humayun, Chiukin Steven Lai 2019-03-12
9748137 Method for void-free cobalt gap fill Chiukin Steven Lai, Jeong-Seok Na, Raashina Humayun, Michal Danek 2017-08-29
7790633 Sequential deposition/anneal film densification method George D. Papasouliotis, Ron Rulkens, Dennis M. Hausmann, Jeff Tobin, Adrianne K. Tipton +1 more 2010-09-07
7678709 Method of forming low-temperature conformal dielectric films Brian Lu, Wai-Fan Yau, Collin Kwok Leung Mui, Bunsen B. Nie 2010-03-16
7482247 Conformal nanolaminate dielectric deposition and etch bag gap fill process George D. Papasouliotis, Ron Rulkins, Dennis M. Hausmann, Jeff Tobin, Adrianne K. Tipton +5 more 2009-01-27
7297608 Method for controlling properties of conformal silica nanolaminates formed by rapid vapor deposition George D. Papasouliotis, Ron Rulkens, Dennis M. Hausmann, Jeff Tobin, Adrianne K. Tipton +1 more 2007-11-20
7294583 Methods for the use of alkoxysilanol precursors for vapor deposition of SiO2 films Ron Rulkens, George D. Papasouliotis, Dennis M. Hausmann, Bunsen B. Nie, Adrianne K. Tipton +1 more 2007-11-13
7271112 Methods for forming high density, conformal, silica nanolaminate films via pulsed deposition layer in structures of confined geometry George D. Papasouliotis, Adrianne K. Tipton, Ron Rulkens, Dennis M. Hausmann, Jeff Tobin 2007-09-18
7223707 Dynamic rapid vapor deposition process for conformal silica laminates George D. Papasouliotis, Jeff Tobin, Ron Rulkens, Dennis M. Hausmann, Adrianne K. Tipton +1 more 2007-05-29
7202185 Silica thin films produced by rapid surface catalyzed vapor deposition (RVD) using a nucleation layer Dennis M. Hausmann, Jeff Tobin, George D. Papasouliotis, Ron Rulkens, Adrianne K. Tipton +1 more 2007-04-10
7148155 Sequential deposition/anneal film densification method George D. Papasouliotis, Ron Rulkens, Dennis M. Hausmann, Jeff Tobin, Adrianne K. Tipton +1 more 2006-12-12
7129189 Aluminum phosphate incorporation in silica thin films produced by rapid surface catalyzed vapor deposition (RVD) Dennis M. Hausmann, Adrianne K. Tipton, Bunsen B. Nie, George D. Papasouliotis, Ron Rulkens 2006-10-31
7097878 Mixed alkoxy precursors and methods of their use for rapid vapor deposition of SiO2 films Ron Rulkens, Dennis M. Hausmann, George D. Papasouliotis, Bunsen B. Nie, Adrianne K. Tipton +1 more 2006-08-29
6846745 High-density plasma process for filling high aspect ratio structures George D. Papasouliotis, Vishal Gauri, Vikram Singh 2005-01-25