Issued Patents All Time
Showing 1–13 of 13 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12331396 | Systems and methods for homogenous intermixing of precursors in alloy atomic layer deposition | Ilanit Fisher, Raashina Humayun, Michal Danek, Patrick A. Van Cleemput | 2025-06-17 |
| 12327762 | Molybdenum fill | Lawrence Schloss, Zhongbo YAN, Patrick A. Van Cleemput, Joshua Collins | 2025-06-10 |
| 12274047 | Line bending control for memory applications | Gorun Butail, Ishtak Karim, Patrick A. Van Cleemput | 2025-04-08 |
| 12203168 | Metal deposition | Ravi Vellanki, Eric H. Lenz, Vinayakaraddy Gulabal, Sanjay Gopinath, Michal Danek +5 more | 2025-01-21 |
| 12148623 | Deposition of tungsten on molybdenum templates | Patrick A. Van Cleemput, Michal Danek | 2024-11-19 |
| 12074029 | Molybdenum deposition | Patrick A. Van Cleemput, Michal Danek | 2024-08-27 |
| 11864372 | Line bending control for memory applications | Gorun Butail, Ishtak Karim, Patrick A. Van Cleemput | 2024-01-02 |
| 11827976 | Systems and methods for homogenous intermixing of precursors in alloy atomic layer deposition | Ilanit Fisher, Raashina Humayun, Michal Danek, Patrick A. Van Cleemput | 2023-11-28 |
| 10777453 | Low resistivity films containing molybdenum | Raashina Humayun, Michal Danek, Chiukin Steven Lai, Joshua Collins, Hanna Bamnolker +3 more | 2020-09-15 |
| 10510590 | Low resistivity films containing molybdenum | Raashina Humayun, Michal Danek, Chiukin Steven Lai, Joshua Collins, Hanna Bamnolker +3 more | 2019-12-17 |
| 10229826 | Systems and methods for forming low resistivity metal contacts and interconnects by reducing and removing metallic oxide | Raihan M. Tarafdar, Jeong-Seok Na, Raashina Humayun, Chiukin Steven Lai | 2019-03-12 |
| 9478411 | Method to tune TiOx stoichiometry using atomic layer deposited Ti film to minimize contact resistance for TiOx/Ti based MIS contact scheme for CMOS | Ishtak Karim, Sanjay Gopinath, Reza Arghavani, Michal Danek | 2016-10-25 |
| 9478438 | Method and apparatus to deposit pure titanium thin film at low temperature using titanium tetraiodide precursor | Ishtak Karim, Sanjay Gopinath, Michal Danek | 2016-10-25 |