Issued Patents All Time
Showing 1–18 of 18 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9293361 | Materials and methods of forming controlled void | Raymond Nicholas Vrtis, Dingjun Wu, Mark Leonard O'Neill, Mark Daniel Bitner, Jean Louise Vincent +1 more | 2016-03-22 |
| 9061317 | Porogens, porogenated precursors and methods for using the same to provide porous organosilica glass films with low dielectric constants | Raymond Nicholas Vrtis, Mark Leonard O'Neill, Jean Vincent, Mary Kathryn Haas | 2015-06-23 |
| 8951342 | Methods for using porogens for low k porous organosilica glass films | Raymond Nicholas Vrtis, Mark Leonard O'Neill, Jean Louise Vincent, Mary Kathryn Haas | 2015-02-10 |
| 8846522 | Materials and methods of forming controlled void | Raymond Nicholas Vrtis, Dingjun Wu, Mark Leonard O'Neill, Mark Daniel Bitner, Jean Louise Vincent +1 more | 2014-09-30 |
| 8399349 | Materials and methods of forming controlled void | Raymond Nicholas Vrtis, Dingjun Wu, Mark Leonard O'Neill, Mark Daniel Bitner, Jean Louise Vincent +1 more | 2013-03-19 |
| 8293001 | Porogens, porogenated precursors and methods for using the same to provide porous organosilica glass films with low dielectric constants | Raymond Nicholas Vrtis, Mark Leonard O'Neill, Jean Louise Vincent, Manchao Xiao, John Anthony Thomas Norman | 2012-10-23 |
| 8137764 | Mechanical enhancer additives for low dielectric films | Jean Louise Vincent, Mark Leonard O'Neill, Raymond Nicholas Vrtis, Brian K. Peterson, Mark Daniel Bitner | 2012-03-20 |
| 7943195 | Porogens, porogenated precursors and methods for using the same to provide porous organosilica glass films with low dielectric constants | Raymond Nicholas Vrtis, Mark Leonard O'Neill, Jean Louise Vincent, Manchao Xiao, John Anthony Thomas Norman | 2011-05-17 |
| 7932188 | Mechanical enhancement of dense and porous organosilicate materials by UV exposure | Mark Leonard O'Neill, Jean Louise Vincent, Raymond Nicholas Vrtis, Mark Daniel Bitner, Eugene Joseph Karwacki, Jr. | 2011-04-26 |
| 7581549 | Method for removing carbon-containing residues from a substrate | Andrew David Johnson, Hoshang Subawalla, Bing Ji, Raymond Nicholas Vrtis, Eugene Joseph Karwacki, Jr. +4 more | 2009-09-01 |
| 7470454 | Non-thermal process for forming porous low dielectric constant films | Mark Leonard O'Neill, Mark Daniel Bitner, Jean Louise Vincent, Raymond Nicholas Vrtis, Eugene Joseph Karwacki, Jr. | 2008-12-30 |
| 7468290 | Mechanical enhancement of dense and porous organosilicate materials by UV exposure | Mark Leonard O'Neill, Jean Louise Vincent, Raymond Nicholas Vrtis, Mark Daniel Bitner, Eugene Joseph Karwacki, Jr. | 2008-12-23 |
| 7404990 | Non-thermal process for forming porous low dielectric constant films | Mark Leonard O'Neill, Mark Daniel Bitner, Jean Louise Vincent, Raymond Nicholas Vrtis, Eugene Joseph Karwacki, Jr. | 2008-07-29 |
| 7384471 | Porogens, porogenated precursors and methods for using the same to provide porous organosilica glass films with low dielectric constants | Raymond Nicholas Vrtis, Mark Leonard O'Neill, Jean Louise Vincent, Manchao Xiao, John Anthony Thomas Norman | 2008-06-10 |
| 7332445 | Porous low dielectric constant compositions and methods for making and using same | Mark Leonard O'Neill, Eugene Joseph Karwacki, Jr., Raymond Nicholas Vrtis, Jean Louise Vincent | 2008-02-19 |
| 7098149 | Mechanical enhancement of dense and porous organosilicate materials by UV exposure | Mark Leonard O'Neill, Jean Louise Vincent, Raymond Nicholas Vrtis, Mark Daniel Bitner, Eugene Joseph Karwacki, Jr. | 2006-08-29 |
| 7074489 | Low dielectric constant material and method of processing by CVD | Mark Leonard O'Neill, Mark Daniel Bitner, Jean Louise Vincent, Raymond Nicholas Vrtis, Brian K. Peterson | 2006-07-11 |
| 6846515 | Methods for using porogens and/or porogenated precursors to provide porous organosilica glass films with low dielectric constants | Raymond Nicholas Vrtis, Mark Leonard O'Neill, Jean Louise Vincent, Manchao Xiao, John Anthony Thomas Norman | 2005-01-25 |