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Yi Zheng |
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Zhen Zhou, Lingguo Zhang |
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Soon-Byung Park |
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Yiming Zhu |
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Method of manufacturing semiconductor structure and semiconductor structure |
Jie Bai, Juanjuan Huang |
2024-09-17 |
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Semiconductor structure and forming method thereof |
Daejoong Won, Soonbyung Park |
2024-09-17 |
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Semiconductor structure and method for forming the same, and memory and method for forming the same |
Yiming Zhu |
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Method of manufacturing semiconductor structure |
Daejoong Won, Soonbyung Park |
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Manufacturing method of a memory and a memory |
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Semiconductor structure and storage circuit |
Xiaoguang Wang, Baolei Wu, Yulei Wu |
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Lianhong WANG |
2024-01-09 |
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Method for manufacturing buried gate and method for manufacturing semiconductor device |
Jie Bai, Mengmeng YANG |
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Method for manufacturing memory and same |
Zhen Zhou, Lingguo Zhang |
2023-12-26 |
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Multi-layer stacks for 3D NAND extendability |
Xinhai Han, Deenesh Padhi, Srinivas Guggilla |
2023-01-31 |
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Method and system for three-dimensional (3D) structure fill |
Ellie Yieh, Ludovic Godet, Srinivas D. Nemani, Gary E. Dickerson |
2021-03-09 |
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PVD deposition and anneal of multi-layer metal-dielectric film |
Minrui Yu, Kai Ma, Thomas Jongwan Kwon, Kaushal K. Singh |
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Method and apparatus for depositing cobalt in a feature |
Jin-Hee Park, Tae Hong Ha, Sang-Hyeob Lee, Thomas Jongwan Kwon, Jaesoo Ahn +2 more |
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Multi-layer stacks for 3D NAND extendibility |
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2020-06-30 |
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Self-aligned nanodots for 3D NAND flash memory |
Sungwon Jun, Saurabh Chopra, Thomas Jongwan Kwon |
2019-10-15 |
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Hybrid carbon hardmask for lateral hardmask recess reduction |
Thomas Jongwan Kwon, Rui Cheng, Abhijit Basu Mallick, Jaesoo Ahn |
2019-09-10 |
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Method and apparatus for depositing cobalt in a feature |
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2018-12-18 |
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Hybrid carbon hardmask for lateral hardmask recess reduction |
Thomas Jongwan Kwon, Rui Cheng, Abhijit Basu Mallick, Jaesoo Ahn |
2018-06-05 |
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