Issued Patents All Time
Showing 1–10 of 10 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12015042 | Structure and material engineering methods for optoelectronic devices signal to noise ratio enhancement | Papo CHEN, Schubert S. Chu, Errol Antonio C. Sanchez, John Boland, Zhiyuan Ye +3 more | 2024-06-18 |
| 9312154 | CVD apparatus for improved film thickness non-uniformity and particle performance | Binh Tran, Anqing Cui, Bernard L. Hwang, Son T. Nguyen, Anh N. Nguyen +1 more | 2016-04-12 |
| 8822312 | Method of forming high growth rate, low resistivity germanium film on silicon substrate | Yi-Chiau Huang, Errol Antonio C. Sanchez | 2014-09-02 |
| 8759201 | Method of forming high growth rate, low resistivity germanium film on silicon substrate | Yi-Chiau Huang, Errol Antonio C. Sanchez | 2014-06-24 |
| 7335266 | Method of forming a controlled and uniform lightly phosphorous doped silicon film | Li Fu, Sheeba J. Panayil, Shulin Wang, Christopher Quentin, Lee Luo +1 more | 2008-02-26 |
| 6982214 | Method of forming a controlled and uniform lightly phosphorous doped silicon film | Li Fu, Sheeba J. Panayil, Shulin Wang, Christopher Quentin, Lee Luo +1 more | 2006-01-03 |
| 6582522 | Emissivity-change-free pumping plate kit in a single wafer chamber | Lee Luo, Henry Ho, Shulin Wang, Binh Tran, Alexander Tam +2 more | 2003-06-24 |
| 6559039 | Doped silicon deposition process in resistively heated single wafer chamber | Shulin Wang, Lee Luo, Steven Chen, Errol Antonio C. Sanchez, Zoran Dragojlovic +1 more | 2003-05-06 |
| 6559074 | Method of forming a silicon nitride layer on a substrate | Steven Chen, Shulin Wang, Lee Luo, Kegang Huang, Sang-Hoon Ahn | 2003-05-06 |
| 6479100 | CVD ruthenium seed for CVD ruthenium deposition | Xiaoliang Jin, Christopher Wade, Elaine Pao, Yaxin Wang, Jun Zhao | 2002-11-12 |