Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › High temperature, high flow rate chemical vapor deposition apparatus and related methods

High temperature, high flow rate chemical vapor deposition apparatus and related methods

US Patent 6189482 · Granted Feb 20, 2001

Estimated economic value: $78,613,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Electronic expansion valve2025
Flexible LED vehicle-mounted display screen and production process thereof2025
Tiled apparatuses2025
Splicing screen display device2025
Electrical connector having an insulative shell with a mold hole2025
Use of tegaserod in preparation of anti-tumor drug2025
Application of glucan in preparation of drug2025
Method for manufacturing thin film transistor array substrate and display panel2025
Force applying device for orthodontic treatment2025
Heater plate2025
Array substrate and display panel2025
Spliced display panel and spliced display device2025