Issued Patents All Time
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10201069 | High frequency power supply device and high frequency power supplying method | Eiich Hayano, Takeshi Nakamura, Yasunori Maekawa, Hiroshi Iizuka | 2019-02-05 |
| 10187965 | Plasma confinement apparatus, and method for confining a plasma | Tuqiang Ni, Qing Qian, Yuehong Fu, Zhaoyang Xu, Xusheng Zhou +1 more | 2019-01-22 |
| 9271384 | Plasma processing apparatus | Jiawei Dong, Feiyun Yang, Lei Yu, Xiaohong Song | 2016-02-23 |
| 9208998 | Multi-station decoupled reactive ion etch chamber | Gerald Yin, Tuqiang Ni, Xueyu Qian | 2015-12-08 |
| 8975194 | Method for manufacturing oxide layer | — | 2015-03-10 |
| 8608851 | Plasma confinement apparatus, and method for confining a plasma | Tom Ni, Qing Qian, Yuehong Fu, Zhaoyang Xu, Xusheng Zhou +1 more | 2013-12-17 |
| 8366829 | Multi-station decoupled reactive ion etch chamber | Gerald Yin, Tuqiang Ni, Xueyu Qian | 2013-02-05 |
| 8336488 | Multi-station plasma reactor with multiple plasma regions | Aihua Chen, Yijun Liu, Lee Luo, Tuqiang Ni, Gerald Yin +1 more | 2012-12-25 |
| 8297225 | Capacitive CVD reactor and methods for plasma CVD process | Gerald Yin, Tuqiang Ni | 2012-10-30 |
| 8111499 | System and method of sensing and removing residual charge from a processed wafer | Tuqiang Ni, Ye Wang, Ruoxin Du, Liang Ouyang | 2012-02-07 |
| 7503996 | Multiple frequency plasma chamber, switchable RF system, and processes using same | Gerald Yin, Xueyu Qian, Tuqiang Ni, Hiroshi Iizuka | 2009-03-17 |
| 5564085 | Cellular telephone RF radiation ameliorating device | Ding Wu | 1996-10-08 |