PA

Paul Arleo

Applied Materials: 3 patents #2,994 of 7,310Top 45%
Cypress Semiconductor: 1 patents #1,072 of 1,852Top 60%
KL Kla-Tencor: 1 patents #809 of 1,394Top 60%
Overall (All Time): #1,005,396 of 4,157,543Top 25%
5
Patents All Time

Issued Patents All Time

Patent #TitleCo-InventorsDate
9134186 Process condition measuring device (PCMD) and method for measuring process conditions in a workpiece processing tool configured to process production workpieces Mei Sun, Farhat A. Quli, Earl Jensen, Vaibhaw Vishal 2015-09-15
6373679 ELECTROSTATIC OR MECHANICAL CHUCK ASSEMBLY CONFERRING IMPROVED TEMPERATURE UNIFORMITY ONTO WORKPIECES HELD THEREBY, WORKPIECE PROCESSING TECHNOLOGY AND/OR APPARATUS CONTAINING THE SAME, AND METHOD(S) FOR HOLDING AND/OR PROCESSING A WORKPIECE WITH THE SAME Jianmin Qiao, James E. Nulty, Siamak Salimian 2002-04-16
6184150 Oxide etch process with high selectivity to nitride suitable for use on surfaces of uneven topography Chan-Lon Yang, Mei Chang, Haojiang Li, Hyman J. Levinstein 2001-02-06
5880037 Oxide etch process using a mixture of a fluorine-substituted hydrocarbon and acetylene that provides high selectivity to nitride and is suitable for use on surfaces of uneven topography 1999-03-09
5176790 Process for forming a via in an integrated circuit structure by etching through an insulation layer while inhibiting sputtering of underlying metal Jon Henri, Graham W. Hills, Jerry Wong, Robert Wu 1993-01-05