Issued Patents All Time
Showing 1–17 of 17 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10460941 | Plasma doping using a solid dopant source | Siamak Salimian, Qi Gao | 2019-10-29 |
| 9437432 | Self-compensating oxide layer | Deven Raj Mittal, Jun Seok Lee | 2016-09-06 |
| 9123509 | Techniques for plasma processing a substrate | George D. Papasouliotis, Kamal Hadidi, Ludovic Godet, Vikram Singh, Timothy J. Miller +1 more | 2015-09-01 |
| 9093104 | Technique for manufacturing bit patterned media | Frank Sinclair, Julian G. Blake, Alexander C. Kontos | 2015-07-28 |
| 8877654 | Pulsed plasma to affect conformal processing | Vikram Singh, Svetlana B. Radovanov, Harold Persing | 2014-11-04 |
| 8698106 | Apparatus for detecting film delamination and a method thereof | George D. Papasouliotis | 2014-04-15 |
| 8679960 | Technique for processing a substrate having a non-planar surface | George D. Papasouliotis, Vikram Singh, Heyun Yin, Ludovic Godet | 2014-03-25 |
| 8465909 | Self-aligned masking for solar cell manufacture | Nicholas P. T. Bateman, Benjamin B. Riordon, Christopher R. Hatem, Deepak A. Ramappa | 2013-06-18 |
| 8431495 | Stencil mask profile | George D. Papasouliotis | 2013-04-30 |
| 8124487 | Method for enhancing tensile stress and source/drain activation using Si:C | Vikram Singh, Hans-Joachim L. Gossman | 2012-02-28 |
| 7279426 | Like integrated circuit devices with different depth | Habib Hichri, Kimberly Larsen, Kevin S. Petrarca | 2007-10-09 |
| 6750495 | Damascene capacitors for integrated circuits | Glenn B. Alers, Tseng-Chung Lee, Daniel J. Vitkavage | 2004-06-15 |
| 6541149 | Article comprising micro fuel cell | Jeremy P. Meyers | 2003-04-01 |
| 6255221 | Methods for running a high density plasma etcher to achieve reduced transistor device damage | Eric A. Hudson, Jaroslaw W. Winniczek, Joel M. Cook | 2001-07-03 |
| 6228277 | Etch endpoint detection | Avinoam Kornblit, Tseng-Chung Lee, Heon Seung Lee | 2001-05-08 |
| 5835221 | Process for fabricating a device using polarized light to determine film thickness | Tseng-Chung Lee | 1998-11-10 |
| 5653894 | Active neural network determination of endpoint in a plasma etch process | Dale E. Ibbotson, Tseng-Chung Lee, Edward A. Rietman | 1997-08-05 |