Issued Patents All Time
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9171897 | Area efficient series MIM capacitor | Queennie Suan Imm Lim | 2015-10-27 |
| 8519403 | Angled implantation for deep submicron device optimization | Che Ta Hsu, Christopher J. Pass, Jeffrey T. Watt, Yanzhong Xu | 2013-08-27 |
| 7883946 | Angled implantation for deep submicron device optimization | Che Ta Hsu, Christopher J. Pass, Jeffrey T. Watt, Yanzhong Xu | 2011-02-08 |
| 5877407 | Plasma etch end point detection process | Gardy Cadet, Tseng-Chung Lee, Edward A. Rietman | 1999-03-02 |
| 5653894 | Active neural network determination of endpoint in a plasma etch process | Tseng-Chung Lee, Helen L. Maynard, Edward A. Rietman | 1997-08-05 |
| 5654903 | Method and apparatus for real time monitoring of wafer attributes in a plasma etch process | Edward A. Reitman, Tseng-Chung Lee | 1997-08-05 |
| 5494697 | Process for fabricating a device using an ellipsometric technique | Nadine Blayo, Tseng-Chung Lee | 1996-02-27 |
| 4960656 | Devices and process for producing devices containing silicon nitride films | Chorng-Ping Chang, Daniel Flamm, John A. Mucha | 1990-10-02 |
| 4918031 | Processes depending on plasma generation using a helical resonator | Daniel Flamm, Wayne Johnson | 1990-04-17 |
| 4689115 | Gaseous etching process | Charles W. Tu | 1987-08-25 |
| 4498953 | Etching techniques | Joel M. Cook, Vincent M. Donnelly, Daniel Flamm, John A. Mucha | 1985-02-12 |
| 4397711 | Crystallographic etching of III-V semiconductor materials | Vincent M. Donnelly, Daniel Flamm | 1983-08-09 |