WJ

Wayne Johnson

TL Tokyo Electron Limited: 50 patents #52 of 5,567Top 1%
Applied Materials: 2 patents #3,641 of 7,310Top 50%
IP Iqe Plc: 2 patents #11 of 43Top 30%
KT Keysight Technologies: 2 patents #116 of 567Top 25%
UN Unknown: 2 patents #12,644 of 83,584Top 20%
Overall (All Time): #31,166 of 4,157,543Top 1%
68
Patents All Time

Issued Patents All Time

Showing 25 most recent of 68 patents

Patent #TitleCo-InventorsDate
10680621 Phase stabilization for a frequency multiplier Reto Zingg, Victor M. Grothen, Lucia Cascio, Hsiang-Yi Chung 2020-06-09
10589354 Systems and methods for depositing charged metal droplets onto a workpiece Lawrence E. Murr, Mike Halpin 2020-03-17
10579574 Instrumentation chassis with high speed bridge board Victor M. Grothen, James David Lusk 2020-03-03
10580871 Nucleation layer for growth of III-nitride structures Oleg Laboutin, Chen-Kai Kao, Chien-Fong Lo, Hugues Marchand 2020-03-03
9917156 Nucleation layer for growth of III-nitride structures Oleg Laboutin, Chen-Kai Kao, Chien-Fong Lo, Hugues Marchand 2018-03-13
9605238 Photo-bioreactor system and method for production of bio-materials Steven Fink, Roxanne E. Abul-Hal, N. Alan Abul-Haj 2017-03-28
9587211 Photo-bioreactor system and method Steven Fink 2017-03-07
9076812 HEMT structure with iron-doping-stop component and methods of forming Oleg Laboutin, Yu Cao 2015-07-07
7462335 Optical monitoring and control system and method for plasma reactors Lianjun Liu 2008-12-09
RE40195 Large area plasma source 2008-04-01
7340472 Organizing and storing hierarchical data in a database having dual structures Eric J. Makus, Robert L. Usibelli, Sean M. Usibelli, Edwin Thorne, III 2008-03-04
7311782 Apparatus for active temperature control of susceptors Eric J. Strang 2007-12-25
7285758 Rapid thermal processing lamp and method for manufacturing the same 2007-10-23
7234862 Apparatus for measuring temperatures of a wafer using specular reflection spectroscopy Shane R. Johnson, Yong-Hang Zhang 2007-06-26
7166233 Pulsed plasma processing method and apparatus Eric J. Strang 2007-01-23
7102292 Method and device for removing harmonics in semiconductor plasma processing systems Richard Parsons 2006-09-05
7091503 Measuring plasma uniformity in-situ at wafer level Maolin Long 2006-08-15
7075031 Method of and structure for controlling electrode temperature Eric J. Strang, Andrej Mitrovic, Jim Fordemwalt 2006-07-11
7066703 Chuck transport method and system 2006-06-27
7030045 Method of fabricating oxides with low defect densities 2006-04-18
7019253 Electrically controlled plasma uniformity in a high density plasma source Thomas Windhorn, Eric J. Strang 2006-03-28
7018553 Optical monitoring and control system and method for plasma reactors Lianjun Liu 2006-03-28
6979954 Inter-stage plasma source Bill Quon 2005-12-27
6960887 Method and apparatus for tuning a plasma reactor chamber Eric J. Strang, Robert Hostetler, Steven Fink 2005-11-01
6949722 Method and apparatus for active temperature control of susceptors Eric J. Strang 2005-09-27