Issued Patents All Time
Showing 51–68 of 68 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6511577 | Reduced impedance chamber | — | 2003-01-28 |
| 6491742 | ESRF coolant degassing process | — | 2002-12-10 |
| 6425953 | All-surface biasable and/or temperature-controlled electrostatically-shielded RF plasma source | — | 2002-07-30 |
| 6422825 | Plasma vacuum pumping cell | Raphael A. Dandl, Gareth Guest | 2002-07-23 |
| 6392187 | Apparatus and method for utilizing a plasma density gradient to produce a flow of particles | — | 2002-05-21 |
| 6385977 | ESRF chamber cooling system and process | — | 2002-05-14 |
| 6351683 | System and method for monitoring and controlling gas plasma processes | Richard Parsons | 2002-02-26 |
| 6339206 | Apparatus and method for adjusting density distribution of a plasma | — | 2002-01-15 |
| 6332961 | Device and method for detecting and preventing arcing in RF plasma systems | Richard Parsons | 2001-12-25 |
| 6313584 | Electrical impedance matching system and method | Richard Parsons | 2001-11-06 |
| 5455070 | Variable rate distribution gas flow reaction chamber | Roger N. Anderson, Paul R. Lindstrom | 1995-10-03 |
| 5269847 | Variable rate distribution gas flow reaction chamber | Roger N. Anderson, Paul R. Lindstrom | 1993-12-14 |
| 5234529 | Plasma generating apparatus employing capacitive shielding and process for using such apparatus | — | 1993-08-10 |
| 4918031 | Processes depending on plasma generation using a helical resonator | Daniel Flamm, Dale E. Ibbotson | 1990-04-17 |
| 4874464 | Process for epitaxial deposition of silicon | Dennis L. Goodwin, Mark Hawkins, Aage Olsen, McDonald Robinson | 1989-10-17 |
| 4798165 | Apparatus for chemical vapor deposition using an axially symmetric gas flow | Wiebe B. deBoer, Klavs F. Jensen, Gary W. Read, McDonald Robinson | 1989-01-17 |
| 4789771 | Method and apparatus for substrate heating in an axially symmetric epitaxial deposition apparatus | McDonald Robinson, Ronald D. Behee, Wiebe B. deBoer | 1988-12-06 |
| 4654509 | Method and apparatus for substrate heating in an axially symmetric epitaxial deposition apparatus | McDonald Robinson, Ronald D. Behee, Wiebe B. deBoer | 1987-03-31 |