MR

McDonald Robinson

ET Epsilon Technology: 8 patents #2 of 9Top 25%
AT AT&T: 5 patents #3,608 of 18,772Top 20%
AA Advanced Semiconductor Materials America: 5 patents #1 of 26Top 4%
ST Superconductor Technologies: 2 patents #33 of 63Top 55%
TR The Arizona Board Of Regents: 1 patents #129 of 428Top 35%
University of California: 1 patents #8,022 of 18,278Top 45%
HO Honeywell: 1 patents #7,507 of 14,447Top 55%
Overall (All Time): #126,009 of 4,157,543Top 4%
30
Patents All Time

Issued Patents All Time

Showing 25 most recent of 30 patents

Patent #TitleCo-InventorsDate
7232487 Method for making an epitaxial germanium temperature sensor Eric H. Silver, Norman W. Madden, Lamonte H. Lawrence 2007-06-19
6770504 Methods and structure for improving wafer bow control Robert D. Horning, Timothy Louis Scullard 2004-08-03
6064081 Silicon-germanium-carbon compositions and processes thereof Richard Westhoff, Charles E. Hunt, Li Ling, Ziv Atzmon 2000-05-16
5961877 Wet chemical etchants Richard Westhoff, Charles E. Hunt, Li Ling 1999-10-05
5906708 Silicon-germanium-carbon compositions in selective etch processes Richard Westhoff, Charles E. Hunt, Li Ling 1999-05-25
5819684 Gas injection system for reaction chambers in CVD systems Mark Hawkins 1998-10-13
5525157 Gas injectors for reaction chambers in CVD systems Mark Hawkins 1996-06-11
5458918 Gas injectors for reaction chambers in CVD systems Mark Hawkins 1995-10-17
5435682 Chemical vapor desposition system Richard Crabb, Mark Hawkins, Dennis L. Goodwin, Armand P. Ferro, Wiebe B. deBoer +1 more 1995-07-25
5411590 Gas injectors for reaction chambers in CVD systems Mark Hawkins 1995-05-02
5358926 Epitaxial thin superconducting thallium-based copper oxide layers William L. Olson, Michael Eddy, Robert B. Hammond, Timothy W. James 1994-10-25
5324155 Wafer handling system with bernoulli pick-up Dennis L. Goodwin, Richard Crabb, Armand P. Ferro 1994-06-28
5221556 Gas injectors for reaction chambers in CVD systems Mark Hawkins 1993-06-22
5156521 Method for loading a substrate into a GVD apparatus Richard Crabb, Mark Hawkins, Dennis L. Goodwin, Armand P. Ferro 1992-10-20
5092728 Substrate loading apparatus for a CVD process Richard Crabb, Mark Hawkins, Dennis L. Goodwin, Armand P. Ferro, Wiebe B. deBoer +1 more 1992-03-03
5080549 Wafer handling system with Bernoulli pick-up Dennis L. Goodwin, Richard Crabb, Armand P. Ferro 1992-01-14
5071830 Metalorganic deposition method for forming epitaxial thallium-based copper oxide superconducting films William L. Olson, Michael Eddy, Robert B. Hammond, Timothy W. James 1991-12-10
5020475 Substrate handling and transporting apparatus Richard Crabb, Mark Hawkins, Dennis L. Goodwin, Armand P. Ferro 1991-06-04
4975561 Heating system for substrates Albert E. Ozias 1990-12-04
4874464 Process for epitaxial deposition of silicon Dennis L. Goodwin, Mark Hawkins, Wayne Johnson, Aage Olsen 1989-10-17
4836138 Heating system for reaction chamber of chemical vapor deposition equipment Albert E. Ozias 1989-06-06
4828224 Chemical vapor deposition system Richard Crabb, Mark Hawkins, Dennis L. Goodwin, Armand P. Ferro, Albert E. Ozias +1 more 1989-05-09
4798165 Apparatus for chemical vapor deposition using an axially symmetric gas flow Wiebe B. deBoer, Klavs F. Jensen, Wayne Johnson, Gary W. Read 1989-01-17
4789771 Method and apparatus for substrate heating in an axially symmetric epitaxial deposition apparatus Ronald D. Behee, Wiebe B. deBoer, Wayne Johnson 1988-12-06
4654509 Method and apparatus for substrate heating in an axially symmetric epitaxial deposition apparatus Ronald D. Behee, Wiebe B. deBoer, Wayne Johnson 1987-03-31