AO

Albert E. Ozias

ET Epsilon Technology: 13 patents #1 of 9Top 15%
AA Advanced Semiconductor Materials America: 4 patents #3 of 26Top 15%
Overall (All Time): #226,464 of 4,157,543Top 6%
20
Patents All Time

Issued Patents All Time

Patent #TitleCo-InventorsDate
5902407 Rotatable substrate supporting mechanism with temperature sensing device for use in chemical vapor deposition equipment Wiebe B. deBoer 1999-05-11
5657150 Electrochromic edge isolation-interconnect system, process, and device for its manufacture William R. Kallman, James D. Williams, Leonard M. Dorfman, Christian F. Schaus, Geoffrey A. Russell +2 more 1997-08-12
5435682 Chemical vapor desposition system Richard Crabb, McDonald Robinson, Mark Hawkins, Dennis L. Goodwin, Armand P. Ferro +1 more 1995-07-25
5427620 Rotatable substrate supporting mechanism with temperature sensing device for use in chemical vapor deposition equipment Wiebe B. deBoer 1995-06-27
5374315 Rotatable substrate supporting mechanism with temperature sensing device for use in chemical vapor deposition equipment Wiebe B. deBoer 1994-12-20
5318634 Substrate supporting apparatus Wiebe B. deBoer 1994-06-07
5261960 Reaction chambers for CVD systems 1993-11-16
5244694 Apparatus for improving the reactant gas flow in a reaction chamber 1993-09-14
5198034 Rotatable substrate supporting mechanism with temperature sensing device for use in chemical vapor deposition equipment Wiebe B. deBoer 1993-03-30
5117769 Drive shaft apparatus for a susceptor Wiebe B. deBoer 1992-06-02
5096534 Method for improving the reactant gas flow in a reaction chamber 1992-03-17
5092728 Substrate loading apparatus for a CVD process Richard Crabb, McDonald Robinson, Mark Hawkins, Dennis L. Goodwin, Armand P. Ferro +1 more 1992-03-03
5044315 Apparatus for improving the reactant gas flow in a reaction chamber 1991-09-03
4996942 Rotatable substrate supporting susceptor with temperature sensors Wiebe B. deBoer 1991-03-05
4993355 Susceptor with temperature sensing device Wiebe B. deBoer 1991-02-19
4975561 Heating system for substrates McDonald Robinson 1990-12-04
4846102 Reaction chambers for CVD systems 1989-07-11
4836138 Heating system for reaction chamber of chemical vapor deposition equipment McDonald Robinson 1989-06-06
4828224 Chemical vapor deposition system Richard Crabb, McDonald Robinson, Mark Hawkins, Dennis L. Goodwin, Armand P. Ferro +1 more 1989-05-09
4821674 Rotatable substrate supporting mechanism with temperature sensing device for use in chemical vapor deposition equipment Wiebe B. deBoer 1989-04-18