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Albert E. Ozias — 20 Patents

ETEpsilon Technology: 13 patents #1 of 9Top 15%
AAAdvanced Semiconductor Materials America: 4 patents #3 of 26Top 15%
Aumsville, OR: #2 of 26 inventorsTop 8%
Oregon: #2,168 of 28,073 inventorsTop 8%
Overall (All Time): #214,803 of 4,157,543Top 6%
20 Patents All Time
Albert E. Ozias has been granted 20 US patents while listed as an inventor at Epsilon Technology. The first was granted in 1989 and the most recent in May 1999. Albert E. Ozias ranks #214,803 of 4,157,543 US inventors in our database (top 5.2%). Patent records list Albert E. Ozias in Aumsville, OR, US.

Patents per Year

Patents granted per year, 1989 to 1999Bar chart with a peak of 4 patents in 1989.peak 41989: 4 patents19891990: 1 patents19901991: 3 patents19911992: 3 patents19921993: 3 patents19931994: 2 patents19941995: 2 patents19951997: 1 patents19971999: 1 patents1999

Issued Patents All Time

Showing 1–20 of 20 patents

Patent #TitleCo-InventorsDate
5902407 Rotatable substrate supporting mechanism with temperature sensing device for use in chemical vapor deposition equipment Wiebe B. deBoer 1999-05-11
5657150 Electrochromic edge isolation-interconnect system, process, and device for its manufacture William R. Kallman, James D. Williams, Leonard M. Dorfman, Christian F. Schaus, Geoffrey A. Russell +2 more 1997-08-12
5435682 Chemical vapor desposition system Richard Crabb, McDonald Robinson, Mark Hawkins, Dennis L. Goodwin, Armand P. Ferro +1 more 1995-07-25
5427620 Rotatable substrate supporting mechanism with temperature sensing device for use in chemical vapor deposition equipment Wiebe B. deBoer 1995-06-27
5374315 Rotatable substrate supporting mechanism with temperature sensing device for use in chemical vapor deposition equipment Wiebe B. deBoer 1994-12-20
5318634 Substrate supporting apparatus Wiebe B. deBoer 1994-06-07
5261960 Reaction chambers for CVD systems — 1993-11-16
5244694 Apparatus for improving the reactant gas flow in a reaction chamber — 1993-09-14
5198034 Rotatable substrate supporting mechanism with temperature sensing device for use in chemical vapor deposition equipment Wiebe B. deBoer 1993-03-30
5117769 Drive shaft apparatus for a susceptor Wiebe B. deBoer 1992-06-02
5096534 Method for improving the reactant gas flow in a reaction chamber — 1992-03-17
5092728 Substrate loading apparatus for a CVD process Richard Crabb, McDonald Robinson, Mark Hawkins, Dennis L. Goodwin, Armand P. Ferro +1 more 1992-03-03
5044315 Apparatus for improving the reactant gas flow in a reaction chamber — 1991-09-03
4996942 Rotatable substrate supporting susceptor with temperature sensors Wiebe B. deBoer 1991-03-05
4993355 Susceptor with temperature sensing device Wiebe B. deBoer 1991-02-19
4975561 Heating system for substrates McDonald Robinson 1990-12-04
4846102 Reaction chambers for CVD systems — 1989-07-11
4836138 Heating system for reaction chamber of chemical vapor deposition equipment McDonald Robinson 1989-06-06
4828224 Chemical vapor deposition system Richard Crabb, McDonald Robinson, Mark Hawkins, Dennis L. Goodwin, Armand P. Ferro +1 more 1989-05-09
4821674 Rotatable substrate supporting mechanism with temperature sensing device for use in chemical vapor deposition equipment Wiebe B. deBoer 1989-04-18

Frequent Collaborators

Wiebe B. deBoer12 shared
McDonald Robinson5 shared
Dennis L. Goodwin3 shared
Armand P. Ferro3 shared
Richard Crabb3 shared
Mark Hawkins3 shared

Nearby-Ranked Inventors

Anthony Mertes20
Ed Merjanian20
Arthur J. Higby20
Daniel Rosenberg20
Anthony J. Kuschel20
Mark E. Fauver20
Markus Wintermantel20
Dominik Schnieders20
Christopher P. Roche20