Issued Patents All Time
Showing 1–18 of 18 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12322633 | Electrostatic chuck with improved temperature control | Hanish Kumar Panavalappil Kumarankutty, Sean M. Seutter, Wendell Glenn Boyd, Jr., Badri Narayan Ramamurthi, Shekhar ATHANI +2 more | 2025-06-03 |
| 12288704 | Methods and apparatus for processing a substrate | Ralph P. ANTONIO, Lee Guan Tay, Peter Lai, Tzu-Fang Huang, Jeffrey C. Hudgens | 2025-04-29 |
| 12011731 | Faceplate tensioning method and apparatus to prevent droop | Yao-Hung YANG, Shantanu Rajiv Gadgil, Tanmay Pramod GURJAR | 2024-06-18 |
| D1027120 | Seal for an assembly in a vapor deposition chamber | Yao-Hung YANG, Eric Ruhland, Saurabh M. Chaudhari, Dien-Yeh Wu, Philip Wayne Nagle +4 more | 2024-05-14 |
| 11710630 | Plasma block with integrated cooling | Tanmay Pramod GURJAR, Sumit Subhash Patankar | 2023-07-25 |
| 11694879 | Component, method of manufacturing the component, and method of cleaning the component | Ian Widlow, Govinda Raj, Gary Urban Keppers, Aravind Dugganna Naik, Francisco Rodarte +1 more | 2023-07-04 |
| 9384950 | Chamber coatings | Ren-Guan Duan, Juan Carlos Rocha-Alvarez, Jianhua Zhou, Ningli Liu, Yihong Chen +1 more | 2016-07-05 |
| 9202736 | Method for refurbishing an electrostatic chuck with reduced plasma penetration and arcing | Kadthala Ramaya Narendrnath, Dmitry Lubomirsky, Xinglong Chen, Muhammad M. Rasheed, Tony Kaushal | 2015-12-01 |
| 8409355 | Low profile process kit | Muhammad M. Rasheed, Teruki Iwashita, Hiroshi Otake, Yuki Koga, Kazutoshi Maehara +2 more | 2013-04-02 |
| 8108981 | Method of making an electrostatic chuck with reduced plasma penetration and arcing | Dmitry Lubomirsky, Kadthala Ramaya Narendranath, Xinglong Chen, Muhammad M. Rasheed, Tony Kaushal | 2012-02-07 |
| 7967913 | Remote plasma clean process with cycled high and low pressure clean steps | Zhong Qiang Hua, Sanjay Kamath, Young S. Lee, Ellie Yieh, Hien Minh Le +1 more | 2011-06-28 |
| 7722737 | Gas distribution system for improved transient phase deposition | Robert Duncan, Siamak Salimian, Muhammad M. Rasheed, Harry Whitesell, Bruno Geoffrion +2 more | 2010-05-25 |
| 7498268 | Gas delivery system for semiconductor processing | Padmanabhan Krishnaraj, Tom K. Cho, Muhammad M. Rasheed, Hemant P. Mungekar, Thanh Pham +1 more | 2009-03-03 |
| 7354501 | Upper chamber for high density plasma CVD | Tom K. Cho, Rolf Guenther, Steve Kim, Mehrdad Moshfegh, Shigeru Takehiro +2 more | 2008-04-08 |
| 7141138 | Gas delivery system for semiconductor processing | Padmanabhan Krishnaraj, Tom K. Cho, Muhammad M. Rasheed, Hemant P. Mungekar, Thanh Pham +1 more | 2006-11-28 |
| 7074298 | High density plasma CVD chamber | Tom K. Cho, Rolf Guenther, Shigeru Takehiro, Masayoshi Nohira, Tetsuya Ishikawa +1 more | 2006-07-11 |
| 6682603 | Substrate support with extended radio frequency electrode upper surface | Dongqing Li, Canfeng Lai, Zhengquan Tan, Steve Kim, Alexander Veyster | 2004-01-27 |
| 6450117 | Directing a flow of gas in a substrate processing chamber | Laxman Murugesh, Padmanaban Krishnaraj, Michael S. Cox, Canfeng Lai, Narendra Dubey +2 more | 2002-09-17 |