Issued Patents All Time
Showing 1–13 of 13 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8021743 | Process chamber component with layered coating and method | Yixing Lin, Daijiang Xu | 2011-09-20 |
| 7910218 | Cleaning and refurbishing chamber components having metal coatings | Yixing Lin, Dajiang Xu | 2011-03-22 |
| 7579067 | Process chamber component with layered coating and method | Yixing Lin, Dajiang Xu | 2009-08-25 |
| 7055732 | Semiconductor processing apparatus including plasma-resistant, welded aluminum structures | Senh Thach, Jennifer Y. Sun, Shun Wu, Yixing Lin | 2006-06-06 |
| 7048814 | Halogen-resistant, anodized aluminum for use in semiconductor processing apparatus | Yixing Lin, Brian T. West, Hong Wang, Shun Wu, Jennifer Y. Sun +1 more | 2006-05-23 |
| 7033447 | Halogen-resistant, anodized aluminum for use in semiconductor processing apparatus | Yixing Lin, Brian T. West, Shun Wu, Senh Thach, Hong Wang +1 more | 2006-04-25 |
| 6902628 | Method of cleaning a coated process chamber component | Hong Wang, Yongxiang He | 2005-06-07 |
| 6899798 | Reusable ceramic-comprising component which includes a scrificial surface layer | Edwin C. Weldon, Yongxiang He, Hong Wang | 2005-05-31 |
| 6776873 | Yttrium oxide based surface coating for semiconductor IC processing vacuum chambers | Jennifer Y. Sun, Shun Wu, Senh Thach, Ananda H. Kumar, Robert Wu +2 more | 2004-08-17 |
| 6713188 | Clean aluminum alloy for semiconductor processing equipment | Shun Wu, Hong Wang, Yixing Lin, Brian T. West | 2004-03-30 |
| 6659331 | Plasma-resistant, welded aluminum structures for use in semiconductor apparatus | Senh Thach, Jennifer Y. Sun, Shun Wu, Yixing Lin | 2003-12-09 |
| 6656535 | Method of fabricating a coated process chamber component | Yongxiang He, Hong Wang | 2003-12-02 |
| 6565984 | Clean aluminum alloy for semiconductor processing equipment | Shun Wu, Hong Wang, Yixing Lin | 2003-05-20 |