Issued Patents All Time
Showing 1–15 of 15 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12340979 | Semiconductor processing chamber for improved precursor flow | Dmitry Lubomirsky, Soonwook Jung, Soonam Park, Raymond W. Lu, Phong Pham +1 more | 2025-06-24 |
| 11915911 | Two piece electrode assembly with gap for plasma control | Saravjeet Singh, Dmitry Lubomirsky, Tae Wan Kim, Kenneth D. Schatz, Tae Seung Cho +1 more | 2024-02-27 |
| 11834744 | Ceramic showerheads with conductive electrodes | Laksheswar Kalita, Soonam Park, Dmitry Lubomirsky, LokKee Loh, Saravjeet Singh +1 more | 2023-12-05 |
| 11735441 | Systems and methods for improved semiconductor etching and component protection | Lok Kee Loh, Dmitry Lubomirsky, Soonwook Jung, Martin Yue Choy, Soonam Park | 2023-08-22 |
| 11591693 | Ceramic showerheads with conductive electrodes | Laksheswar Kalita, Soonam Park, Dmitry Lubomirsky, LokKee Loh, Saravjeet Singh +1 more | 2023-02-28 |
| 11302520 | Chamber apparatus for chemical etching of dielectric materials | Dmitry Lubomirsky, Kirby H. Floyd, Son T. Nguyen, David Palagashvili, Alexander Tam +1 more | 2022-04-12 |
| 11101136 | Process window widening using coated parts in plasma etch processes | Dongqing Yang, Peter M. Hillman, Lala Zhu, Nitin K. Ingle, Dmitry Lubomirsky +2 more | 2021-08-24 |
| 10920319 | Ceramic showerheads with conductive electrodes | Laksheswar Kalita, Soonam Park, Dmitry Lubomirsky, LokKee Loh, Saravjeet Singh +1 more | 2021-02-16 |
| 10699879 | Two piece electrode assembly with gap for plasma control | Saravjeet Singh, Dmitry Lubomirsky, Tae Wan Kim, Kenneth D. Schatz, Tae Seung Cho +1 more | 2020-06-30 |
| 10522371 | Systems and methods for improved semiconductor etching and component protection | Lok Kee Loh, Dmitry Lubomirsky, Soonwook Jung, Martin Yue Choy, Soonam Park | 2019-12-31 |
| 10504754 | Systems and methods for improved semiconductor etching and component protection | Lok Kee Loh, Dmitry Lubomirsky, Soonwook Jung, Martin Yue Choy, Soonam Park | 2019-12-10 |
| 10297458 | Process window widening using coated parts in plasma etch processes | Dongqing Yang, Peter M. Hillman, Lala Zhu, Nitin K. Ingle, Dmitry Lubomirsky +2 more | 2019-05-21 |
| 9972477 | Multiple point gas delivery apparatus for etching materials | Dmitry Lubomirsky | 2018-05-15 |
| 9659753 | Grooved insulator to reduce leakage current | Tae Seung Cho, Sang Won Kang, Dongqing Yang, Raymond W. Lu, Peter M. Hillman +3 more | 2017-05-23 |
| 8333842 | Apparatus for etching semiconductor wafers | Dmitry Lubomirsky, Lun Tsuei | 2012-12-18 |