Issued Patents All Time
Showing 1–22 of 22 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12315736 | Methods of highly selective silicon oxide removal | Lala Zhu, Shi Che, Nitin K. Ingle | 2025-05-27 |
| 11915950 | Multi-zone semiconductor substrate supports | Mehmet Tugrul Samir, Dmitry Lubomirsky, Peter M. Hillman, Soonam Park, Martin Yue Choy +1 more | 2024-02-27 |
| 11515179 | Semiconductor processing chamber multistage mixing apparatus | Mehmet Tugrul Samir | 2022-11-29 |
| 11417534 | Selective material removal | Ming Xia, Ching-Mei Hsu | 2022-08-16 |
| 11361939 | Semiconductor processing chamber for multiple precursor flow | Mehmet Tugrul Samir, Dmitry Lubomirsky, Peter M. Hillman, Soonam Park, Martin Yue Choy +1 more | 2022-06-14 |
| 11276590 | Multi-zone semiconductor substrate supports | Mehmet Tugrul Samir, Dmitry Lubomirsky, Peter M. Hillman, Soonam Park, Martin Yue Choy +1 more | 2022-03-15 |
| 11276559 | Semiconductor processing chamber for multiple precursor flow | Mehmet Tugrul Samir, Dmitry Lubomirsky, Peter M. Hillman, Soonam Park, Martin Yue Choy +1 more | 2022-03-15 |
| 11164724 | Seasoning process for establishing a stable process and extending chamber uptime for semiconductor chip processing | Sang Won Kang, Nicholas Celeste, Dmitry Lubomirsky, Peter M. Hillman, Douglas B. Hayden | 2021-11-02 |
| 11101136 | Process window widening using coated parts in plasma etch processes | Tien Fak Tan, Peter M. Hillman, Lala Zhu, Nitin K. Ingle, Dmitry Lubomirsky +2 more | 2021-08-24 |
| 10964512 | Semiconductor processing chamber multistage mixing apparatus and methods | Mehmet Tugrul Samir, Dmitry Lubomirsky | 2021-03-30 |
| 10699921 | Semiconductor processing chamber multistage mixing apparatus | Mehmet Tugrul Samir | 2020-06-30 |
| 10679870 | Semiconductor processing chamber multistage mixing apparatus | Mehmet Tugrul Samir | 2020-06-09 |
| 10297458 | Process window widening using coated parts in plasma etch processes | Tien Fak Tan, Peter M. Hillman, Lala Zhu, Nitin K. Ingle, Dmitry Lubomirsky +2 more | 2019-05-21 |
| 10134581 | Methods and apparatus for selective dry etch | Ning Li, Mihaela Balseanu, Li-Qun Xia, Anchuan Wang | 2018-11-20 |
| 10008366 | Seasoning process for establishing a stable process and extending chamber uptime for semiconductor chip processing | Sang Won Kang, Nicholas Celeste, Dmitry Lubomirsky, Peter M. Hillman, Douglas B. Hayden | 2018-06-26 |
| 9721789 | Saving ion-damaged spacers | Lala Zhu, Fei Wang, Nitin K. Ingle | 2017-08-01 |
| 9659753 | Grooved insulator to reduce leakage current | Tae Seung Cho, Sang Won Kang, Raymond W. Lu, Peter M. Hillman, Nicholas Celeste +3 more | 2017-05-23 |
| 9064816 | Dry-etch for selective oxidation removal | Sang Hyuk Kim, Young S. Lee, Weon Young Jung, Sang Jin Kim, Ching-Mei Hsu +2 more | 2015-06-23 |
| 8741778 | Uniform dry etch in two stages | Jing Tang, Nitin K. Ingle | 2014-06-03 |
| 8501629 | Smooth SiConi etch for silicon-containing films | Jing Tang, Nitin K. Ingle | 2013-08-06 |
| 8475674 | High-temperature selective dry etch having reduced post-etch solid residue | Kiran V. Thadani, Jing Tang, Nitin K. Ingle | 2013-07-02 |
| 8435902 | Invertable pattern loading with dry etch | Jing Tang, Nitin K. Ingle, Shankar Venkataraman | 2013-05-07 |