| 12315736 |
Methods of highly selective silicon oxide removal |
Lala Zhu, Shi Che, Nitin K. Ingle |
2025-05-27 |
| 11915950 |
Multi-zone semiconductor substrate supports |
Mehmet Tugrul Samir, Dmitry Lubomirsky, Peter M. Hillman, Soonam Park, Martin Yue Choy +1 more |
2024-02-27 |
| 11515179 |
Semiconductor processing chamber multistage mixing apparatus |
Mehmet Tugrul Samir |
2022-11-29 |
| 11417534 |
Selective material removal |
Ming Xia, Ching-Mei Hsu |
2022-08-16 |
| 11361939 |
Semiconductor processing chamber for multiple precursor flow |
Mehmet Tugrul Samir, Dmitry Lubomirsky, Peter M. Hillman, Soonam Park, Martin Yue Choy +1 more |
2022-06-14 |
| 11276590 |
Multi-zone semiconductor substrate supports |
Mehmet Tugrul Samir, Dmitry Lubomirsky, Peter M. Hillman, Soonam Park, Martin Yue Choy +1 more |
2022-03-15 |
| 11276559 |
Semiconductor processing chamber for multiple precursor flow |
Mehmet Tugrul Samir, Dmitry Lubomirsky, Peter M. Hillman, Soonam Park, Martin Yue Choy +1 more |
2022-03-15 |
| 11164724 |
Seasoning process for establishing a stable process and extending chamber uptime for semiconductor chip processing |
Sang Won Kang, Nicholas Celeste, Dmitry Lubomirsky, Peter M. Hillman, Douglas B. Hayden |
2021-11-02 |
| 11101136 |
Process window widening using coated parts in plasma etch processes |
Tien Fak Tan, Peter M. Hillman, Lala Zhu, Nitin K. Ingle, Dmitry Lubomirsky +2 more |
2021-08-24 |
| 10964512 |
Semiconductor processing chamber multistage mixing apparatus and methods |
Mehmet Tugrul Samir, Dmitry Lubomirsky |
2021-03-30 |
| 10699921 |
Semiconductor processing chamber multistage mixing apparatus |
Mehmet Tugrul Samir |
2020-06-30 |
| 10679870 |
Semiconductor processing chamber multistage mixing apparatus |
Mehmet Tugrul Samir |
2020-06-09 |
| 10297458 |
Process window widening using coated parts in plasma etch processes |
Tien Fak Tan, Peter M. Hillman, Lala Zhu, Nitin K. Ingle, Dmitry Lubomirsky +2 more |
2019-05-21 |
| 10134581 |
Methods and apparatus for selective dry etch |
Ning Li, Mihaela Balseanu, Li-Qun Xia, Anchuan Wang |
2018-11-20 |
| 10008366 |
Seasoning process for establishing a stable process and extending chamber uptime for semiconductor chip processing |
Sang Won Kang, Nicholas Celeste, Dmitry Lubomirsky, Peter M. Hillman, Douglas B. Hayden |
2018-06-26 |
| 9721789 |
Saving ion-damaged spacers |
Lala Zhu, Fei Wang, Nitin K. Ingle |
2017-08-01 |
| 9659753 |
Grooved insulator to reduce leakage current |
Tae Seung Cho, Sang Won Kang, Raymond W. Lu, Peter M. Hillman, Nicholas Celeste +3 more |
2017-05-23 |
| 9064816 |
Dry-etch for selective oxidation removal |
Sang Hyuk Kim, Young S. Lee, Weon Young Jung, Sang Jin Kim, Ching-Mei Hsu +2 more |
2015-06-23 |
| 8741778 |
Uniform dry etch in two stages |
Jing Tang, Nitin K. Ingle |
2014-06-03 |
| 8501629 |
Smooth SiConi etch for silicon-containing films |
Jing Tang, Nitin K. Ingle |
2013-08-06 |
| 8475674 |
High-temperature selective dry etch having reduced post-etch solid residue |
Kiran V. Thadani, Jing Tang, Nitin K. Ingle |
2013-07-02 |
| 8435902 |
Invertable pattern loading with dry etch |
Jing Tang, Nitin K. Ingle, Shankar Venkataraman |
2013-05-07 |
