Issued Patents All Time
Showing 25 most recent of 36 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11796142 | Spot lamp | Yueping Wang, Shitao Deng | 2023-10-24 |
| 11637002 | Methods and systems to enhance process uniformity | Saravjeet Singh, Alan Tso, Zihui Li, Hanshen Zhang, Dmitry Lubomirsky | 2023-04-25 |
| 11239061 | Methods and systems to enhance process uniformity | Saravjeet Singh, Alan Tso, Zihui Li, Hanshen Zhang, Dmitry Lubomirsky | 2022-02-01 |
| 10892198 | Systems and methods for improved performance in semiconductor processing | Chirantha Rodrigo, Suketu Arun Parikh, Tsz Keung Cheung, Satya Gowthami Achanta, Saravjeet Singh +1 more | 2021-01-12 |
| 10062578 | Methods for etch of metal and metal-oxide films | Anchuan Wang, Nitin K. Ingle | 2018-08-28 |
| 10026597 | Hydrogen plasma based cleaning process for etch hardware | Chirantha Rodrigo, Lili Ji, Anchuan Wang, Nitin K. Ingle | 2018-07-17 |
| 9887096 | Differential silicon oxide etch | Seung Ho Park, Yunyu Wang, Anchuan Wang, Nitin K. Ingle | 2018-02-06 |
| 9881805 | Silicon selective removal | Zihui Li, Ching-Mei Hsu, Hanshen Zhang | 2018-01-30 |
| 9842744 | Methods for etch of SiN films | Anchuan Wang, Nitin K. Ingle | 2017-12-12 |
| 9754800 | Selective etch for silicon films | Anchuan Wang, Nitin K. Ingle | 2017-09-05 |
| 9576809 | Etch suppression with germanium | Mikhail Korolik, Nitin K. Ingle, Anchuan Wang, Jie Liu | 2017-02-21 |
| 9564338 | Silicon-selective removal | Hanshen Zhang | 2017-02-07 |
| 9472412 | Procedure for etch rate consistency | Hanshen Zhang | 2016-10-18 |
| 9449845 | Selective titanium nitride etching | Jie Liu, Anchuan Wang, Nitin K. Ingle, Seung Ho Park, Zhijun Chen +1 more | 2016-09-20 |
| 9437451 | Radical-component oxide etch | Zhijun Chen, Ching-Mei Hsu, Seung Ho Park, Anchuan Wang, Nitin K. Ingle | 2016-09-06 |
| 9418858 | Selective etch of silicon by way of metastable hydrogen termination | Anchuan Wang, Nitin K. Ingle, Young S. Lee | 2016-08-16 |
| 9390937 | Silicon-carbon-nitride selective etch | Zhijun Chen, Anchuan Wang, Nitin K. Ingle | 2016-07-12 |
| 9343327 | Methods for etch of sin films | Anchuan Wang, Nitin K. Ingle | 2016-05-17 |
| 9324576 | Selective etch for silicon films | Anchuan Wang, Nitin K. Ingle | 2016-04-26 |
| 9245762 | Procedure for etch rate consistency | Hanshen Zhang | 2016-01-26 |
| 9236266 | Dry-etch for silicon-and-carbon-containing films | Anchuan Wang, Nitin K. Ingle, Yunyu Wang, Young S. Lee | 2016-01-12 |
| 9093390 | Conformal oxide dry etch | Anchuan Wang, Nitin K. Ingle, Young S. Lee | 2015-07-28 |
| 9064815 | Methods for etch of metal and metal-oxide films | Anchuan Wang, Nitin K. Ingle | 2015-06-23 |
| 9034770 | Differential silicon oxide etch | Seung Ho Park, Yunyu Wang, Anchuan Wang, Nitin K. Ingle | 2015-05-19 |
| 9023734 | Radical-component oxide etch | Zhijun Chen, Ching-Mei Hsu, Seung Ho Park, Anchuan Wang, Nitin K. Ingle | 2015-05-05 |