Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
YW

Yunyu Wang — 12 Patents

Applied Materials: 8 patents #1,563 of 7,310Top 25%
CRCrossbar: 2 patents #33 of 53Top 65%
Overall (All Time): #396,045 of 4,157,543Top 10%
12 Patents All Time
Yunyu Wang has been granted 12 US patents while listed as an inventor at Applied Materials. The first was granted in 2013 and the most recent in December 2025. Yunyu Wang ranks #396,045 of 4,157,543 US inventors in our database (top 9.5%). Patent records list Yunyu Wang in Xiamen, CA, CN.

Issued Patents All Time

Showing 1–12 of 12 patents

Patent #TitleCo-InventorsDateApprox Value ⓘ
12497340 Method for recovering phosphorus based on cyclic hydrothermal carbonization of wetland plants Xizhi Cui, Juan Wang, Guan-Ping Chen, Fan Yu, Jirui Wang +4 more 2025-12-16
12312687 Powder coating device Maosheng Zhao, Tong Wang, Yanfeng Liu 2025-05-27
11944020 Using aluminum as etch stop layer Sundar Narayanan, Natividad Vasquez, Zhen Gu 2024-03-26
10873023 Using aluminum as etch stop layer Sundar Narayanan, Natividad Vasquez, Zhen Gu 2020-12-22
9887096 Differential silicon oxide etch Seung Ho Park, Jingchun Zhang, Anchuan Wang, Nitin K. Ingle 2018-02-06 $31,277,000
9236266 Dry-etch for silicon-and-carbon-containing films Jingchun Zhang, Anchuan Wang, Nitin K. Ingle, Young S. Lee 2016-01-12 $9,921,000
9034770 Differential silicon oxide etch Seung Ho Park, Jingchun Zhang, Anchuan Wang, Nitin K. Ingle 2015-05-19 $22,098,000
8771536 Dry-etch for silicon-and-carbon-containing films Jingchun Zhang, Anchuan Wang, Nitin K. Ingle, Young S. Lee 2014-07-08 $11,201,000
8679982 Selective suppression of dry-etch rate of materials containing both silicon and oxygen Anchuan Wang, Jingchun Zhang, Nitin K. Ingle, Young S. Lee 2014-03-25 $18,865,000
8679983 Selective suppression of dry-etch rate of materials containing both silicon and nitrogen Anchuan Wang, Jingchun Zhang, Nitin K. Ingle, Young S. Lee 2014-03-25 $18,865,000
8642481 Dry-etch for silicon-and-nitrogen-containing films Anchuan Wang, Jingchun Zhang, Nitin K. Ingle, Young S. Lee 2014-02-04 $11,933,000
8541312 Selective suppression of dry-etch rate of materials containing both silicon and nitrogen Anchuan Wang, Jingchun Zhang, Nitin K. Ingle, Young S. Lee 2013-09-24 $38,252,000