Issued Patents All Time
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12312687 | Powder coating device | Maosheng Zhao, Tong Wang, Yanfeng Liu | 2025-05-27 |
| 11944020 | Using aluminum as etch stop layer | Sundar Narayanan, Natividad Vasquez, Zhen Gu | 2024-03-26 |
| 10873023 | Using aluminum as etch stop layer | Sundar Narayanan, Natividad Vasquez, Zhen Gu | 2020-12-22 |
| 9887096 | Differential silicon oxide etch | Seung Ho Park, Jingchun Zhang, Anchuan Wang, Nitin K. Ingle | 2018-02-06 |
| 9236266 | Dry-etch for silicon-and-carbon-containing films | Jingchun Zhang, Anchuan Wang, Nitin K. Ingle, Young S. Lee | 2016-01-12 |
| 9034770 | Differential silicon oxide etch | Seung Ho Park, Jingchun Zhang, Anchuan Wang, Nitin K. Ingle | 2015-05-19 |
| 8771536 | Dry-etch for silicon-and-carbon-containing films | Jingchun Zhang, Anchuan Wang, Nitin K. Ingle, Young S. Lee | 2014-07-08 |
| 8679982 | Selective suppression of dry-etch rate of materials containing both silicon and oxygen | Anchuan Wang, Jingchun Zhang, Nitin K. Ingle, Young S. Lee | 2014-03-25 |
| 8679983 | Selective suppression of dry-etch rate of materials containing both silicon and nitrogen | Anchuan Wang, Jingchun Zhang, Nitin K. Ingle, Young S. Lee | 2014-03-25 |
| 8642481 | Dry-etch for silicon-and-nitrogen-containing films | Anchuan Wang, Jingchun Zhang, Nitin K. Ingle, Young S. Lee | 2014-02-04 |
| 8541312 | Selective suppression of dry-etch rate of materials containing both silicon and nitrogen | Anchuan Wang, Jingchun Zhang, Nitin K. Ingle, Young S. Lee | 2013-09-24 |