Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Dry-etch for silicon-and-carbon-containing films

Dry-etch for silicon-and-carbon-containing films

US Patent 8771536 · Granted Jul 8, 2014

Estimated economic value: $11,201,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method for recovering phosphorus based on cyclic hydrothermal carbonization of w2025
Self-aligned wide backside power rail contacts to multiple transistor sources2025
Array substrate, method for manufacturing array substrate and display device2025
Selective etching between silicon-and-germanium-containing materials with varyin2025
Selective etching between silicon-and-germanium-containing materials with varyin2025
Semiconductor chamber components with advanced dual layer nickel-containing coat2025
Selective etching of silicon-and-germanium-containing materials with increased s2025
Selective etching of silicon-and-germanium-containing materials with increased s2025
Low temperature graphene growth2025
Multi color stack for self aligned dual pattern formation for multi purpose devi2025
Integration processes utilizing boron-doped silicon materials2025
Powder coating device2025