MZ

Maosheng Zhao

Applied Materials: 9 patents #1,414 of 7,310Top 20%
IN Intermolecular: 7 patents #84 of 248Top 35%
📍 Xiamen, CA: #14 of 41 inventorsTop 35%
Overall (All Time): #264,778 of 4,157,543Top 7%
17
Patents All Time

Issued Patents All Time

Showing 1–17 of 17 patents

Patent #TitleCo-InventorsDate
12312687 Powder coating device Yunyu Wang, Tong Wang, Yanfeng Liu 2025-05-27
8932995 Combinatorial process system Rick Endo, Kurt H. Weiner, Indranil De, James Tsung, Jeremy Cheng 2015-01-13
8771483 Combinatorial process system Rick Endo, Kurt H. Weiner, Indranil De, James Tsung, Jeremy Cheng 2014-07-08
8770143 Multi-region processing system Rick Endo, Kurt H. Weiner, Indranil De, James Tsung 2014-07-08
8758581 Combinatorial process system Rick Endo, Kurt H. Weiner, Indranil De, James Tsung, Jeremy Cheng 2014-06-24
8449678 Combinatorial process system Rick Endo, Kurt H. Weiner, Indranil De, James Tsung, Jeremy Cheng 2013-05-28
8387563 Combinatorial process system Rick Endo, Jeremy Cheng, Indranil De, James Tsung, Kurt H. Weiner 2013-03-05
8039052 Multi-region processing system and heads Rick Endo, Kurt H. Weiner, Indranil De, James Tsung 2011-10-18
7654224 Method and apparatus for cleaning a CVD chamber Juan Carlos Rocha-Alvarez, Inna Shmurun, Soova Sen, Mao D. Lim, Shankar Venkataraman +1 more 2010-02-02
7500445 Method and apparatus for cleaning a CVD chamber Juan Carlos Rocha-Alvarez, Inna Shmurun, Soova Sen, Mao D. Lim, Shankar Venkataraman +1 more 2009-03-10
7464717 Method for cleaning a CVD chamber Juan Carlos Rocha-Alvarez, Inna Shmurun, Soova Sen, Mao D. Lim, Shankar Venkataraman +1 more 2008-12-16
7465357 Computer-readable medium that contains software for executing a method for cleaning a CVD chamber Juan Carlos Rocha-Alvarez, Inna Shmurun, Soova Sen, Mao D. Lim, Shankar Venkataraman +1 more 2008-12-16
6946033 Heated gas distribution plate for a processing chamber Lun Tsuei, Soovo Sen, Ju-Hyung Lee, Juan Carlos Rocha-Alvarez, Inna Shmurun +2 more 2005-09-20
6932092 Method for cleaning plasma enhanced chemical vapor deposition chamber using very high frequency energy Juan Carlos Rocha-Alvarez, Shankar Venkataraman 2005-08-23
6923189 Cleaning of CVD chambers using remote source with cxfyoz based chemistry Annamalai Lakshmanan, Ju-Hyung Lee, Troy Kim, Shankar Venkataraman 2005-08-02
6914014 Method for curing low dielectric constant film using direct current bias Lihua Li, Tzu-Fang Huang, Li-Qun Xia, Juan Carlos Rocha-Alvarez 2005-07-05
6797643 Plasma enhanced CVD low k carbon-doped silicon oxide film deposition using VHF-RF power Juan Carlos Rocha-Alvarez, Ying Yu, Shankar Venkataraman, Srinivas D. Nemani, Li-Qun Xia 2004-09-28