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Closed-loop dome thermal control apparatus for a semiconductor wafer processing system |
Patrick Leahey, Jerry Chen, Richard E. Remington, Simon Yavelberg, Robert E. Ryan +3 more |
2002-04-09 |
| 5897712 |
Plasma uniformity control for an inductive plasma source |
Hiroji Hanawa, Peter Loewenhardt, Gerald Yin |
1999-04-27 |
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Gas injection slit nozzle for a plasma process reactor |
Dan Maydan, Steve S. Y. Mak, Donald Olgado, Gerald Yin, James S. Papanu +1 more |
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Gas injection slit nozzle for a plasma process reactor |
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Dual load-path fastener |
— |
1994-07-12 |
