Issued Patents All Time
Showing 1–17 of 17 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12405164 | Spatial optical emission spectroscopy for etch uniformity | Blake Erickson, Keith R. Berding, Michael Kutney, Tsung Feng Wu, Michael D. Willwerth +1 more | 2025-09-02 |
| 12339645 | Estimation of chamber component conditions using substrate measurements | Chunlei Zhang, Michael Kutney | 2025-06-24 |
| 12283503 | Substrate measurement subsystem | Upendra Ummethala, Blake Erickson, Prashanth Kumar, Michael Kutney, Steven Trey Tindel | 2025-04-22 |
| 12216455 | Chamber component condition estimation using substrate measurements | Chunlei Zhang, Michael Kutney | 2025-02-04 |
| 12191176 | Integrated substrate measurement system to improve manufacturing process performance | Upendra Ummethala, Blake Erickson, Prashanth Kumar, Michael Kutney, Steven Trey Tindel | 2025-01-07 |
| 12148647 | Integrated substrate measurement system | Patricia A. Schulze, Gregory John Freeman, Michael Kutney, Arunkumar Ramachandraiah, Chih Chung Chou +1 more | 2024-11-19 |
| D1045923 | Portion of a display panel with a graphical user interface | Sidharth Bhatia, Jeffrey Yat Shan Au, Shawn Levesque, Michael David Howells, Raja Sekhar Jetti | 2024-10-08 |
| D1045924 | Portion of a display panel with a graphical user interface | Sidharth Bhatia, Jeffrey Yat Shan Au, Shawn Levesque, Michael David Howells, Raja Sekhar Jetti | 2024-10-08 |
| 12031910 | Transmission corrected plasma emission using in-situ optical reflectometry | Patrick Tae, Blake Erickson, Chunlei Zhang | 2024-07-09 |
| D1031743 | Portion of a display panel with a graphical user interface | Sidharth Bhatia, Jeffrey Yat Shan Au, Shawn Levesque, Michael David Howells, Raja Sekhar Jetti | 2024-06-18 |
| 12009191 | Thin film, in-situ measurement through transparent crystal and transparent substrate within processing chamber wall | Patrick Tae, Blake Erickson, Michael D. Willwerth, Barry Craver | 2024-06-11 |
| 11927543 | Multiple reflectometry for measuring etch parameters | Blake Erickson, Keith R. Berding, Michael Kutney, Soumendra N. Barman, Michelle SanPedro +1 more | 2024-03-12 |
| 11830779 | In-situ etch material selectivity detection system | Keith R. Berding, Blake Erickson, Soumendra N. Barman | 2023-11-28 |
| 11688616 | Integrated substrate measurement system to improve manufacturing process performance | Upendra Ummethala, Blake Erickson, Prashanth Kumar, Michael Kutney, Steven Trey Tindel | 2023-06-27 |
| 11668602 | Spatial optical emission spectroscopy for etch uniformity | Blake Erickson, Keith R. Berding, Michael Kutney, Tsung Feng Wu, Michael D. Willwerth +1 more | 2023-06-06 |
| 11619594 | Multiple reflectometry for measuring etch parameters | Blake Erickson, Keith R. Berding, Michael Kutney, Soumendra N. Barman, Michelle SanPedro +1 more | 2023-04-04 |
| D977504 | Portion of a display panel with a graphical user interface | Upendra Ummethala, Blake Erickson, Prashanth Kumar, Michael Kutney, Steven Trey Tindel | 2023-02-07 |