PT

Patrick Tae

Applied Materials: 15 patents #903 of 7,310Top 15%
KL Kla: 1 patents #347 of 758Top 50%
IN Intel: 1 patents #18,218 of 30,777Top 60%
Overall (All Time): #266,479 of 4,157,543Top 7%
17
Patents All Time

Issued Patents All Time

Patent #TitleCo-InventorsDate
12432461 Smart camera substrate Upendra Ummethala, Philip Allan Kraus, Keith R. Berding, Blake Erickson, Devendra Channappa Holeyannavar +4 more 2025-09-30
12418972 Confocal chromatic metrology for EUV source condition monitoring Caijun Su, Ravichandra Jagannath, Brian Ahr 2025-09-16
12163911 Capacitive sensor housing for chamber condition monitoring Yaoling Pan, Leonard Tedeschi, Michael D. Willwerth, Daniel T. McCormick 2024-12-10
12123090 Differential capacitive sensor for in-situ film thickness and dielectric constant measurement Yaoling Pan, Leonard Tedeschi 2024-10-22
12114083 Smart camera substrate Upendra Ummethala, Philip Allan Kraus, Keith R. Berding, Blake Erickson, Devendra Channappa Holeyannavar +4 more 2024-10-08
12031910 Transmission corrected plasma emission using in-situ optical reflectometry Zhaozhao Zhu, Blake Erickson, Chunlei Zhang 2024-07-09
12009191 Thin film, in-situ measurement through transparent crystal and transparent substrate within processing chamber wall Blake Erickson, Zhaozhao Zhu, Michael D. Willwerth, Barry Craver 2024-06-11
12009236 Sensors and system for in-situ edge ring erosion monitor Yaoling Pan, Michael D. Willwerth, Leonard Tedeschi, Daniel Sang Byun, Philip Allan Kraus +5 more 2024-06-11
12000041 Processing chamber condition and process state monitoring using optical reflector attached to processing chamber liner 2024-06-04
11781214 Differential capacitive sensors for in-situ film thickness and dielectric constant measurement Yaoling Pan, Leonard Tedeschi 2023-10-10
11736818 Smart camera substrate Upendra Ummethala, Philip Allan Kraus, Keith R. Berding, Blake Erickson, Devendra Channappa Holeyannavar +4 more 2023-08-22
11708635 Processing chamber condition and process state monitoring using optical reflector attached to processing chamber liner 2023-07-25
11581206 Capacitive sensor for chamber condition monitoring Yaoling Pan, Leonard Tedeschi, Jennifer Y. Sun, Philip Allan Kraus, Xiaopu Li +6 more 2023-02-14
11551905 Resonant process monitor Yaoling Pan, Vijaykumar Krithivasan, Shimin Mao, Kelvin Chan, Michael D. Willwerth +5 more 2023-01-10
11545346 Capacitive sensing data integration for plasma chamber condition monitoring Yaoling Pan, Michael D. Willwerth, Leonard Tedeschi, Kiyki-Shiy Shang, Mikhail Taraboukhine +2 more 2023-01-03
11415538 Capacitive sensor housing for chamber condition monitoring Yaoling Pan, Leonard Tedeschi, Michael D. Willwerth, Daniel T. McCormick 2022-08-16
11284018 Smart camera substrate Upendra Ummethala, Philip Allan Kraus, Keith R. Berding, Blake Erickson, Devendra Channappa Holeyannavar +4 more 2022-03-22