| 12469686 |
Process characterization and correction using optical wall process sensor (OWPS) |
Jeffrey Yat Shan Au, Joshua Maher, Varoujan Chakarian, Sidharth Bhatia, Zhen Zhu +1 more |
2025-11-11 |
|
| 12442765 |
Transmission corrected plasma emission using in-situ optical reflectometry |
Zhen Zhu, Blake Erickson, Chengxu Zhang |
2025-10-14 |
|
| 12437979 |
Capacitive sensors and capacitive sensing locations for plasma chamber condition monitoring |
Yaoling Pan, Leonard Tedeschi, Philip Allan Kraus, Michael D. Willwerth |
2025-10-07 |
|
| 12432461 |
Smart camera substrate |
Upendra Ummethala, Philip Allan Kraus, Keith R. Berding, Blake Erickson, Devendra Channappa Holeyannavar +4 more |
2025-09-30 |
|
| 12418972 |
Confocal chromatic metrology for EUV source condition monitoring |
Caijun Su, Ravichandra Jagannath, Brian Ahr |
2025-09-16 |
|
| 12163911 |
Capacitive sensor housing for chamber condition monitoring |
Yaoling Pan, Leonard Tedeschi, Michael D. Willwerth, Daniel T. McCormick |
2024-12-10 |
$69,596,000 |
| 12123090 |
Differential capacitive sensor for in-situ film thickness and dielectric constant measurement |
Yaoling Pan, Leonard Tedeschi |
2024-10-22 |
$83,950,000 |
| 12114083 |
Smart camera substrate |
Upendra Ummethala, Philip Allan Kraus, Keith R. Berding, Blake Erickson, Devendra Channappa Holeyannavar +4 more |
2024-10-08 |
$69,128,000 |
| 12031910 |
Transmission corrected plasma emission using in-situ optical reflectometry |
Zhaozhao Zhu, Blake Erickson, Chunlei Zhang |
2024-07-09 |
$62,454,000 |
| 12009236 |
Sensors and system for in-situ edge ring erosion monitor |
Yaoling Pan, Michael D. Willwerth, Leonard Tedeschi, Daniel Sang Byun, Philip Allan Kraus +5 more |
2024-06-11 |
$84,570,000 |
| 12009191 |
Thin film, in-situ measurement through transparent crystal and transparent substrate within processing chamber wall |
Blake Erickson, Zhaozhao Zhu, Michael D. Willwerth, Barry Craver |
2024-06-11 |
$84,570,000 |
| 12000041 |
Processing chamber condition and process state monitoring using optical reflector attached to processing chamber liner |
— |
2024-06-04 |
$68,807,000 |
| 11781214 |
Differential capacitive sensors for in-situ film thickness and dielectric constant measurement |
Yaoling Pan, Leonard Tedeschi |
2023-10-10 |
$39,034,000 |
| 11736818 |
Smart camera substrate |
Upendra Ummethala, Philip Allan Kraus, Keith R. Berding, Blake Erickson, Devendra Channappa Holeyannavar +4 more |
2023-08-22 |
$40,609,000 |
| 11708635 |
Processing chamber condition and process state monitoring using optical reflector attached to processing chamber liner |
— |
2023-07-25 |
$93,796,000 |
| 11581206 |
Capacitive sensor for chamber condition monitoring |
Yaoling Pan, Leonard Tedeschi, Jennifer Y. Sun, Philip Allan Kraus, Xiaopu Li +6 more |
2023-02-14 |
$35,617,000 |
| 11551905 |
Resonant process monitor |
Yaoling Pan, Vijaykumar Krithivasan, Shimin Mao, Kelvin Chan, Michael D. Willwerth +5 more |
2023-01-10 |
$14,061,000 |
| 11545346 |
Capacitive sensing data integration for plasma chamber condition monitoring |
Yaoling Pan, Michael D. Willwerth, Leonard Tedeschi, Kiyki-Shiy Shang, Mikhail Taraboukhine +2 more |
2023-01-03 |
$39,123,000 |
| 11415538 |
Capacitive sensor housing for chamber condition monitoring |
Yaoling Pan, Leonard Tedeschi, Michael D. Willwerth, Daniel T. McCormick |
2022-08-16 |
$38,686,000 |
| 11284018 |
Smart camera substrate |
Upendra Ummethala, Philip Allan Kraus, Keith R. Berding, Blake Erickson, Devendra Channappa Holeyannavar +4 more |
2022-03-22 |
$64,102,000 |
