Issued Patents All Time
Showing 1–24 of 24 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12265377 | Autonomous substrate processing system | Priyadarshi Panda, Lei Lian, Pengyu Han, Todd Egan, Prashant Aji +2 more | 2025-04-01 |
| 12237158 | Etch feedback for control of upstream process | Priyadarshi Panda, Lei Lian | 2025-02-25 |
| 12163911 | Capacitive sensor housing for chamber condition monitoring | Yaoling Pan, Patrick Tae, Michael D. Willwerth, Daniel T. McCormick | 2024-12-10 |
| 12123090 | Differential capacitive sensor for in-situ film thickness and dielectric constant measurement | Patrick Tae, Yaoling Pan | 2024-10-22 |
| 12094716 | Chambers and coatings for reducing backside damage | Kartik Ramaswamy, Benjamin Schwarz, Changgong Wang, Vahid Firouzdor, Sumanth Banda +1 more | 2024-09-17 |
| 12009236 | Sensors and system for in-situ edge ring erosion monitor | Yaoling Pan, Patrick Tae, Michael D. Willwerth, Daniel Sang Byun, Philip Allan Kraus +5 more | 2024-06-11 |
| 11781214 | Differential capacitive sensors for in-situ film thickness and dielectric constant measurement | Patrick Tae, Yaoling Pan | 2023-10-10 |
| 11735486 | Process monitor device having a plurality of sensors arranged in concentric circles | Kartik Ramaswamy | 2023-08-22 |
| 11709477 | Autonomous substrate processing system | Priyadarshi Panda, Lei Lian, Pengyu Han, Todd Egan, Prashant Aji +2 more | 2023-07-25 |
| 11581206 | Capacitive sensor for chamber condition monitoring | Yaoling Pan, Patrick Tae, Jennifer Y. Sun, Philip Allan Kraus, Xiaopu Li +6 more | 2023-02-14 |
| 11551905 | Resonant process monitor | Yaoling Pan, Vijaykumar Krithivasan, Shimin Mao, Kelvin Chan, Michael D. Willwerth +5 more | 2023-01-10 |
| 11545346 | Capacitive sensing data integration for plasma chamber condition monitoring | Yaoling Pan, Patrick Tae, Michael D. Willwerth, Kiyki-Shiy Shang, Mikhail Taraboukhine +2 more | 2023-01-03 |
| 11415538 | Capacitive sensor housing for chamber condition monitoring | Yaoling Pan, Patrick Tae, Michael D. Willwerth, Daniel T. McCormick | 2022-08-16 |
| 11348846 | Wafer processing tool having a micro sensor | — | 2022-05-31 |
| 11088000 | Wafer based corrosion and time dependent chemical effects | Benjamin Schwarz, Changhun Lee, Ping Han Hsieh, Adauto Diaz, Daniel T. McCormick | 2021-08-10 |
| 10923405 | Wafer processing equipment having capacitive micro sensors | Kartik Ramaswamy, Daniel T. McCormick, Robert Meagley | 2021-02-16 |
| 10818561 | Process monitor device having a plurality of sensors arranged in concentric circles | Kartik Ramaswamy | 2020-10-27 |
| 10818564 | Wafer processing tool having a micro sensor | — | 2020-10-27 |
| 10718719 | Particle monitoring device | Kartik Ramaswamy | 2020-07-21 |
| 10515862 | Wafer based corrosion and time dependent chemical effects | Benjamin Schwarz, Changhun Lee, Ping Han Hsieh, Adauto Diaz, Daniel T. McCormick | 2019-12-24 |
| 10083883 | Wafer processing equipment having capacitive micro sensors | Kartik Ramaswamy, Daniel T. McCormick, Robert Meagley | 2018-09-25 |
| 10067070 | Particle monitoring device | Kartik Ramaswamy | 2018-09-04 |
| 9975758 | Wafer processing equipment having exposable sensing layers | Lili Ji, Olivier Joubert, Dmitry Lubomirsky, Philip Allan Kraus, Daniel T. McCormick | 2018-05-22 |
| 9725302 | Wafer processing equipment having exposable sensing layers | Lili Ji, Olivier Joubert, Dmitry Lubomirsky, Philip Allan Kraus, Daniel T. McCormick | 2017-08-08 |