| 12265377 |
Autonomous substrate processing system |
Priyadarshi Panda, Lei Lian, Pengyu Han, Todd Egan, Prashant Aji +2 more |
2025-04-01 |
| 12237158 |
Etch feedback for control of upstream process |
Priyadarshi Panda, Lei Lian |
2025-02-25 |
| 12163911 |
Capacitive sensor housing for chamber condition monitoring |
Yaoling Pan, Patrick Tae, Michael D. Willwerth, Daniel T. McCormick |
2024-12-10 |
| 12123090 |
Differential capacitive sensor for in-situ film thickness and dielectric constant measurement |
Patrick Tae, Yaoling Pan |
2024-10-22 |
| 12094716 |
Chambers and coatings for reducing backside damage |
Kartik Ramaswamy, Benjamin Schwarz, Changgong Wang, Vahid Firouzdor, Sumanth Banda +1 more |
2024-09-17 |
| 12009236 |
Sensors and system for in-situ edge ring erosion monitor |
Yaoling Pan, Patrick Tae, Michael D. Willwerth, Daniel Sang Byun, Philip Allan Kraus +5 more |
2024-06-11 |
| 11781214 |
Differential capacitive sensors for in-situ film thickness and dielectric constant measurement |
Patrick Tae, Yaoling Pan |
2023-10-10 |
| 11735486 |
Process monitor device having a plurality of sensors arranged in concentric circles |
Kartik Ramaswamy |
2023-08-22 |
| 11709477 |
Autonomous substrate processing system |
Priyadarshi Panda, Lei Lian, Pengyu Han, Todd Egan, Prashant Aji +2 more |
2023-07-25 |
| 11581206 |
Capacitive sensor for chamber condition monitoring |
Yaoling Pan, Patrick Tae, Jennifer Y. Sun, Philip Allan Kraus, Xiaopu Li +6 more |
2023-02-14 |
| 11551905 |
Resonant process monitor |
Yaoling Pan, Vijaykumar Krithivasan, Shimin Mao, Kelvin Chan, Michael D. Willwerth +5 more |
2023-01-10 |
| 11545346 |
Capacitive sensing data integration for plasma chamber condition monitoring |
Yaoling Pan, Patrick Tae, Michael D. Willwerth, Kiyki-Shiy Shang, Mikhail Taraboukhine +2 more |
2023-01-03 |
| 11415538 |
Capacitive sensor housing for chamber condition monitoring |
Yaoling Pan, Patrick Tae, Michael D. Willwerth, Daniel T. McCormick |
2022-08-16 |
| 11348846 |
Wafer processing tool having a micro sensor |
— |
2022-05-31 |
| 11088000 |
Wafer based corrosion and time dependent chemical effects |
Benjamin Schwarz, Changhun Lee, Ping Han Hsieh, Adauto Diaz, Daniel T. McCormick |
2021-08-10 |
| 10923405 |
Wafer processing equipment having capacitive micro sensors |
Kartik Ramaswamy, Daniel T. McCormick, Robert Meagley |
2021-02-16 |
| 10818561 |
Process monitor device having a plurality of sensors arranged in concentric circles |
Kartik Ramaswamy |
2020-10-27 |
| 10818564 |
Wafer processing tool having a micro sensor |
— |
2020-10-27 |
| 10718719 |
Particle monitoring device |
Kartik Ramaswamy |
2020-07-21 |
| 10515862 |
Wafer based corrosion and time dependent chemical effects |
Benjamin Schwarz, Changhun Lee, Ping Han Hsieh, Adauto Diaz, Daniel T. McCormick |
2019-12-24 |
| 10083883 |
Wafer processing equipment having capacitive micro sensors |
Kartik Ramaswamy, Daniel T. McCormick, Robert Meagley |
2018-09-25 |
| 10067070 |
Particle monitoring device |
Kartik Ramaswamy |
2018-09-04 |
| 9975758 |
Wafer processing equipment having exposable sensing layers |
Lili Ji, Olivier Joubert, Dmitry Lubomirsky, Philip Allan Kraus, Daniel T. McCormick |
2018-05-22 |
| 9725302 |
Wafer processing equipment having exposable sensing layers |
Lili Ji, Olivier Joubert, Dmitry Lubomirsky, Philip Allan Kraus, Daniel T. McCormick |
2017-08-08 |
