Issued Patents All Time
Showing 26–50 of 59 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6712020 | Toroidal plasma source for plasma processing | Michael S. Cox, Canfeng Lai, Robert B. Majewski, David Wanamaker, Christopher T. Lane +2 more | 2004-03-30 |
| 6673199 | Shaping a plasma with a magnetic field to control etch rate uniformity | John M. Yamartino, Dmitry Lubomirsky, Saravjeet Singh | 2004-01-06 |
| 6581612 | Chamber cleaning with fluorides of iodine | Shamouil Shamouilian, Pavel Ionov, Pamanabhan Krishnaraj | 2003-06-24 |
| 6569775 | Method for enhancing plasma processing performance | John M. Yamartino, Hui Chen, Diana Xiaobing Ma | 2003-05-27 |
| 6566272 | Method for providing pulsed plasma during a portion of a semiconductor wafer process | Alex Paterson, John M. Yamartino, Wade Zawalski | 2003-05-20 |
| 6558564 | Plasma energy control by inducing plasma instability | Wade Zawalski | 2003-05-06 |
| 6508198 | Automatic tuning in a tapped RF transformer inductive source of a plasma reactor for processing a semiconductor wafer | Daniel J. Hoffman, Victor H. Fuentes, Qiwei Liang | 2003-01-21 |
| 6503367 | Magnetically enhanced inductively coupled plasma reactor with magnetically confined plasma | Gerald Yin, Philip M. Salzman | 2003-01-07 |
| 6475335 | RF plasma reactor with hybrid conductor and multi-radius dome ceiling | Gerald Yin, Diana Xiabing Ma, Philip M. Salzman, Allen Zhao, Hiroji Hanawa | 2002-11-05 |
| 6471822 | Magnetically enhanced inductively coupled plasma reactor with magnetically confined plasma | Gerald Yin, Arnold Kholodenko, Hong Chin Shan, Chii Guang Lee, Dan Katz | 2002-10-29 |
| 6449871 | Semiconductor process chamber having improved gas distributor | Arnold Kholodenko, Dmitry Lubomirsky, Guang-Jye Shiau, Shamouil Shamouilian | 2002-09-17 |
| 6418874 | Toroidal plasma source for plasma processing | Michael S. Cox, Canfeng Lai, Robert B. Majewski, David Wanamaker, Christopher T. Lane +2 more | 2002-07-16 |
| 6402885 | Magnetically enhanced inductively coupled plasma reactor with magnetically confined plasma | Gerald Yin, Philip M. Salzman | 2002-06-11 |
| 6356097 | Capacitive probe for in situ measurement of wafer DC bias voltage | Arthur H. Sato, Valentin Todorov | 2002-03-12 |
| 6352049 | Plasma assisted processing chamber with separate control of species density | Gerald Yin, Arnold Kolandenko, Hong Ching Shan, Chii Guang Lee, Yan Ye +9 more | 2002-03-05 |
| 6270687 | RF plasma method | Yan Ye, Donald Olgado, Avi Tepman, Diana Xiaobing Ma, Gerald Yin +2 more | 2001-08-07 |
| 6270617 | RF plasma reactor with hybrid conductor and multi-radius dome ceiling | Gerald Yin, Diana Xiabing Ma, Philip M. Salzman, Allen Zhao, Hiroji Hanawa | 2001-08-07 |
| 6247425 | Method and apparatus for improving processing and reducing charge damage in an inductively coupled plasma reactor | Dimitris Lymberopoulos, John M. Yamartino | 2001-06-19 |
| 6248250 | RF plasma reactor with hybrid conductor and multi-radius dome ceiling | Hiroji Hanawa, Gerald Yin, Diana Xiaobing Ma, Philip M. Saizman, Allen Zhao | 2001-06-19 |
| 6189484 | Plasma reactor having a helicon wave high density plasma source | Gerald Yin, Chii Guang Lee, Arnold Kholodenko, Hongching Shan, Diana Xiaobing Ma +1 more | 2001-02-20 |
| 6185839 | Semiconductor process chamber having improved gas distributor | Arnold Kholodenko, Dmitry Lubomirsky, Guang-Jye Shiau, Shamouil Shamouilian | 2001-02-13 |
| 6085688 | Method and apparatus for improving processing and reducing charge damage in an inductively coupled plasma reactor | Dimitris Lymberopoulos, John M. Yamartino | 2000-07-11 |
| 6071372 | RF plasma etch reactor with internal inductive coil antenna and electrically conductive chamber walls | Yan Ye, Donald Olgado, Avi Tepman, Diana Xiaobing Ma, Gerald Yin +2 more | 2000-06-06 |
| 6030486 | Magnetically confined plasma reactor for processing a semiconductor wafer | Gerald Yin, Philip M. Salzman | 2000-02-29 |
| 5942889 | Capacitive probe for in situ measurement of wafer DC bias voltage | Arthur H. Sato, Valentin Todorov | 1999-08-24 |