Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Plasma processing apparatus and method for confining an RF plasma under very high gas flow and RF power density conditions

Plasma processing apparatus and method for confining an RF plasma under very high gas flow and RF power density conditions

US Patent 6744212 · Granted Jun 1, 2004

Estimated economic value: $10,167,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Pharmaceutical compositions comprising nilotinib2025
Pharmaceutical composition for drug delivery2025
Etch selectivity control in atomic layer etching2025
Pharmaceutical composition for nasal delivery2025
Deep neural network generation of domain names2024
Rotary atomizer2024
Method for controlling at least one servomotor, associated control device, robot2024
Filter media for a drum filter2024
Pharmaceutical composition for nasal delivery2024
Modular dust collection system2024
Method for operating a hydraulic actuator2023
Assembly comprising a connector and a handling clip2023