SL

Siqing Lu

Applied Materials: 21 patents #612 of 7,310Top 9%
Samsung: 5 patents #22,466 of 75,807Top 30%
Overall (All Time): #151,087 of 4,157,543Top 4%
26
Patents All Time

Issued Patents All Time

Showing 25 most recent of 26 patents

Patent #TitleCo-InventorsDate
12400833 Methods and apparatus for processing a substrate Abhishek Chowdhury, Jon C. Farr, Ravikumar Patil, Eller Y. Juco, Yi Zheng 2025-08-26
12106945 Plasma processing apparatus and method of manufacturing semiconductor device using the same Cheonkyu Lee, Takafumi Noguchi 2024-10-01
12100579 Deposition ring for thin substrate handling via edge clamping Abhishek Chowdhury, Edwin C. Suarez, Harisha Sathyanarayana, Nataraj Bhaskar Rao 2024-09-24
D1038049 Cover ring for use in semiconductor processing chamber Abhishek Chowdhury, Harisha Sathyanarayana, Edwin C. Suarez, Nataraj Bhaskar Rao 2024-08-06
11996315 Thin substrate handling via edge clamping Abhishek Chowdhury, Harisha Sathyanarayana, Edwin C. Suarez, Nataraj Bhaskar Rao 2024-05-28
11881375 Common substrate and shadow ring lift apparatus Abhishek Chowdhury, Nataraj Bhaskar Rao, Ravikumar Patil 2024-01-23
11728198 Electrostatic chuck and wafer etching device including the same Myoung Soo Park, Michio Ishikawa, Masashi Kikuchi 2023-08-15
11538697 Substrate processing apparatus Sang Ki Nam, Jang-Yeob Lee, Sungyeol Kim, Sunghyup Kim, Soonam Park 2022-12-27
11244839 Plasma processing apparatus Cheonkyu Lee, Takafumi Noguchi 2022-02-08
10529618 Methods of manufacturing a semiconductor device Sang-Hoon Ahn, Xinglong Chen, Ki Hyun Kim, Kyu In Shim 2020-01-07
9685655 Complex showerhead coating apparatus with electrospray for lithium ion battery Fei Wang, Hooman Bolandi, Connie P. Wang, Victor Pebenito, Michael Kutney +2 more 2017-06-20
7811411 Thermal management of inductively coupled plasma reactors Qiwei Liang, Irene Chou, Steven H. Kim, Young S. Lee, Ellie Yieh +1 more 2010-10-12
7799704 Gas baffle and distributor for semiconductor processing chamber Soonam Park, Farhan Ahmad, Hemant P. Mungekar, Sanjay Kamath, Young S. Lee 2010-09-21
7789993 Internal balanced coil for inductively coupled high density plasma processing chamber Robert Chen, Canfeng Lai, Xinglong Chen, Weiyi Luo, Zhong Qiang Hua +4 more 2010-09-07
7777483 Method and apparatus for measuring a thickness of a layer of a wafer Lawrence Chung-Lai Lei, Yu-Chia Chang, Cecilia Martner, Quyen Pham, Yu Gu +3 more 2010-08-17
7740706 Gas baffle and distributor for semiconductor processing chamber Soonam Park, Farhan Ahmad, Hemant P. Mungekar, Sanjay Kamath, Young S. Lee 2010-06-22
7722719 Gas baffle and distributor for semiconductor processing chamber Lawrence Chung-Lai Lei, Steven Gianoulakis, Won Bae Bang, David Sun, Yen-Kun Wang 2010-05-25
7651587 Two-piece dome with separate RF coils for inductively coupled plasma reactors Qiwei Liang, Canfeng Lai, Robert Chen, Jason Bloking, Irene Chou +3 more 2010-01-26
7572647 Internal balanced coil for inductively coupled high density plasma processing chamber Robert Chen, Canfeng Lai, Xinglong Chen, Weiyi Luo, Zhong Qiang Hua +4 more 2009-08-11
7510624 Self-cooling gas delivery apparatus under high vacuum for high density plasma applications Qiwei Liang 2009-03-31
7355394 Apparatus and method of dynamically measuring thickness of a layer of a substrate Lawrence Chung-Lai Lei, Yu-Chia Chang, Cecilia Martner, Quyen Pham, Yu Gu +3 more 2008-04-08
7201803 Valve control system for atomic layer deposition chamber Yu-Chia Chang, Dongxi Sun, Vinh Dang, Michael Yang, Anzhong Chang +2 more 2007-04-10
7112961 Method and apparatus for dynamically measuring the thickness of an object Lawrence Chung-Lai Lei, Yu-Chia Chang, Cecilia Martner, Quyen Pham, Yu Gu +3 more 2006-09-26
6734020 Valve control system for atomic layer deposition chamber Yu-Chia Chang, Dongxi Sun, Vinh Dang, Michael Yang, Anzhong Chang +2 more 2004-05-11
6660126 Lid assembly for a processing system to facilitate sequential deposition techniques Anh N. Nguyen, Michael Yang, Ming Xi, Hua Chung, Anzhong Chang +1 more 2003-12-09