| 12456309 |
Mitigation strategies for lane marking misdetection |
Wen-Chi Lin, Zhenhong Yang, Xinyu Du, Yao Hu, Shengbing Jiang +1 more |
2025-10-28 |
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| 12400833 |
Methods and apparatus for processing a substrate |
Abhishek Chowdhury, Jon C. Farr, Ravikumar Patil, Eller Y. Juco, Yi Zheng |
2025-08-26 |
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| 12106945 |
Plasma processing apparatus and method of manufacturing semiconductor device using the same |
Cheonkyu Lee, Takafumi Noguchi |
2024-10-01 |
|
| 12100579 |
Deposition ring for thin substrate handling via edge clamping |
Abhishek Chowdhury, Edwin C. Suarez, Harisha Sathyanarayana, Nataraj Bhaskar Rao |
2024-09-24 |
$100,019,000 |
| D1038049 |
Cover ring for use in semiconductor processing chamber |
Abhishek Chowdhury, Harisha Sathyanarayana, Edwin C. Suarez, Nataraj Bhaskar Rao |
2024-08-06 |
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| 11996315 |
Thin substrate handling via edge clamping |
Abhishek Chowdhury, Harisha Sathyanarayana, Edwin C. Suarez, Nataraj Bhaskar Rao |
2024-05-28 |
$67,076,000 |
| 11881375 |
Common substrate and shadow ring lift apparatus |
Abhishek Chowdhury, Nataraj Bhaskar Rao, Ravikumar Patil |
2024-01-23 |
$48,508,000 |
| 11728198 |
Electrostatic chuck and wafer etching device including the same |
Myoung Soo Park, Michio Ishikawa, Masashi Kikuchi |
2023-08-15 |
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| 11538697 |
Substrate processing apparatus |
Sang Ki Nam, Jang-Yeob Lee, Sungyeol Kim, Sunghyup Kim, Soonam Park |
2022-12-27 |
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| 11244839 |
Plasma processing apparatus |
Cheonkyu Lee, Takafumi Noguchi |
2022-02-08 |
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| 10529618 |
Methods of manufacturing a semiconductor device |
Sang-Hoon Ahn, Xinglong Chen, Ki Hyun Kim, Kyu In Shim |
2020-01-07 |
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| 9685655 |
Complex showerhead coating apparatus with electrospray for lithium ion battery |
Fei Wang, Hooman Bolandi, Connie P. Wang, Victor Pebenito, Michael Kutney +2 more |
2017-06-20 |
$22,588,000 |
| 7811411 |
Thermal management of inductively coupled plasma reactors |
Qiwei Liang, Irene Chou, Steven H. Kim, Young S. Lee, Ellie Yieh +1 more |
2010-10-12 |
$9,610,000 |
| 7799704 |
Gas baffle and distributor for semiconductor processing chamber |
Soonam Park, Farhan Ahmad, Hemant P. Mungekar, Sanjay Kamath, Young S. Lee |
2010-09-21 |
$8,059,000 |
| 7789993 |
Internal balanced coil for inductively coupled high density plasma processing chamber |
Robert Chen, Canfeng Lai, Xinglong Chen, Weiyi Luo, Zhong Qiang Hua +4 more |
2010-09-07 |
$5,434,000 |
| 7777483 |
Method and apparatus for measuring a thickness of a layer of a wafer |
Lawrence Chung-Lai Lei, Yu-Chia Chang, Cecilia Martner, Quyen Pham, Yu Gu +3 more |
2010-08-17 |
$3,871,000 |
| 7740706 |
Gas baffle and distributor for semiconductor processing chamber |
Soonam Park, Farhan Ahmad, Hemant P. Mungekar, Sanjay Kamath, Young S. Lee |
2010-06-22 |
$30,835,000 |
| 7722719 |
Gas baffle and distributor for semiconductor processing chamber |
Lawrence Chung-Lai Lei, Steven Gianoulakis, Won Bae Bang, David Sun, Yen-Kun Wang |
2010-05-25 |
$16,074,000 |
| 7651587 |
Two-piece dome with separate RF coils for inductively coupled plasma reactors |
Qiwei Liang, Canfeng Lai, Robert Chen, Jason Bloking, Irene Chou +3 more |
2010-01-26 |
$9,867,000 |
| 7572647 |
Internal balanced coil for inductively coupled high density plasma processing chamber |
Robert Chen, Canfeng Lai, Xinglong Chen, Weiyi Luo, Zhong Qiang Hua +4 more |
2009-08-11 |
$21,048,000 |
| 7510624 |
Self-cooling gas delivery apparatus under high vacuum for high density plasma applications |
Qiwei Liang |
2009-03-31 |
$28,191,000 |
| 7355394 |
Apparatus and method of dynamically measuring thickness of a layer of a substrate |
Lawrence Chung-Lai Lei, Yu-Chia Chang, Cecilia Martner, Quyen Pham, Yu Gu +3 more |
2008-04-08 |
$17,034,000 |
| 7201803 |
Valve control system for atomic layer deposition chamber |
Yu-Chia Chang, Dongxi Sun, Vinh Dang, Michael Yang, Anzhong Chang +2 more |
2007-04-10 |
$37,340,000 |
| 7112961 |
Method and apparatus for dynamically measuring the thickness of an object |
Lawrence Chung-Lai Lei, Yu-Chia Chang, Cecilia Martner, Quyen Pham, Yu Gu +3 more |
2006-09-26 |
$15,511,000 |
| 6734020 |
Valve control system for atomic layer deposition chamber |
Yu-Chia Chang, Dongxi Sun, Vinh Dang, Michael Yang, Anzhong Chang +2 more |
2004-05-11 |
$50,143,000 |
