Issued Patents All Time
Showing 1–10 of 10 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12400833 | Methods and apparatus for processing a substrate | Abhishek Chowdhury, Ravikumar Patil, Eller Y. Juco, Yi Zheng, Siqing Lu | 2025-08-26 |
| 12165877 | Methods for etching a material layer for semiconductor applications | Zhigang Wang, Jiao Yang, Heng Wang, Alfredo Granados, Ruizhe Ren | 2024-12-10 |
| 11940819 | Mass flow controller based fast gas exchange | Abhishek Chowdhury, Ravikumar Patil, Arun Chakravarthy Chakravarthy, Saravanan Chandrabalu, Prabhuraj Kuberan | 2024-03-26 |
| 11915940 | Method of depositing a pre-etch protective layer | Zhi-Gang Wang, Jiao Yang, Alfredo Granados, Heng Wang, Rui Ren | 2024-02-27 |
| 11551942 | Methods and apparatus for cleaning a substrate after processing | Manoj A. Gajendra, Kyle M. Hanson, Mahadev Joshi, Arvind Thiyagarajan | 2023-01-10 |
| 10211030 | Source RF power split inner coil to improve BCD and etch depth performance | Rongping Wang, Ruizhe Ren, Chethan Mangalore, Peter DEMONTE, Parthiban Balakrishna | 2019-02-19 |
| 9070633 | Method and apparatus for high efficiency gas dissociation in inductive coupled plasma reactor | Roy C. Nangoy, Saravjeet Singh, Sharma Pamarthy, Ajay Kumar | 2015-06-30 |
| 9039908 | Post etch reactive plasma milling to smooth through substrate via sidewalls and other deeply etched features | Sharma Pamarthy, Khalid Mohiuddin Sirajuddin | 2015-05-26 |
| 8753474 | Method and apparatus for high efficiency gas dissociation in inductive couple plasma reactor | Roy C. Nangoy, Saravjeet Singh, Sharma Pamarthy, Ajay Kumar | 2014-06-17 |
| 8158522 | Method of forming a deep trench in a substrate | Khalid Mohiuddin Sirajuddin, Digvijay A. Raorane, Sharma Pamarthy | 2012-04-17 |