SP

Sharma Pamarthy

Applied Materials: 9 patents #1,414 of 7,310Top 20%
Overall (All Time): #574,885 of 4,157,543Top 15%
9
Patents All Time

Issued Patents All Time

Patent #TitleCo-InventorsDate
9070633 Method and apparatus for high efficiency gas dissociation in inductive coupled plasma reactor Roy C. Nangoy, Saravjeet Singh, Jon C. Farr, Ajay Kumar 2015-06-30
9039908 Post etch reactive plasma milling to smooth through substrate via sidewalls and other deeply etched features Jon C. Farr, Khalid Mohiuddin Sirajuddin 2015-05-26
8753474 Method and apparatus for high efficiency gas dissociation in inductive couple plasma reactor Roy C. Nangoy, Saravjeet Singh, Jon C. Farr, Ajay Kumar 2014-06-17
8475625 Apparatus for etching high aspect ratio features Huutri Dao, Xiaoping Zhou, Kelly A. McDonough, Jivko Dinev, Farid Abooameri +9 more 2013-07-02
8158522 Method of forming a deep trench in a substrate Khalid Mohiuddin Sirajuddin, Digvijay A. Raorane, Jon C. Farr 2012-04-17
6979652 Etching multi-shaped openings in silicon Anisul Khan, Sanjay Thekdi, Ajay Kumar 2005-12-27
6905616 Method of releasing devices from a substrate Ajay Kumar, Anisul Khan, Sanjay Thekdi 2005-06-14
6897155 Method for etching high-aspect-ratio features Ajay Kumar, Anisul Khan, Dragan Podlesnik, Axel Henke, Stephan Wege +1 more 2005-05-24
6593244 Process for etching conductors at high etch rates Yiqiong Wang, Anisul Khan, Ajay Kumar, Dragan Podlesnik 2003-07-15